Acoustic reflection coefficient of silicon wafers in megasonic cleaning tanks

Ming Zang, David B Kittelson, T. H. Kuehn, R. Gouk

Research output: Contribution to journalArticlepeer-review

4 Scopus citations

Abstract

Reflection coefficients of silicon wafers in megasonic cleaning tanks have been determined theoretically and experimentally. The experimental results obtained indicate that the model of layered solid in liquids is a good predictor of reflection coefficients for silicon wafers in liquids. At frequency of about 1 MHz, high reflection from silicon wafers occurs at large incident angles. There are also two troughs of low reflection for incident angles between 0°-90°. The Young's modulus and Poisson's ratio of the Silicon (110) orientation give the best agreement between the model and experimental results.

Original languageEnglish (US)
Pages (from-to)833-836
Number of pages4
JournalProceedings of the IEEE Ultrasonics Symposium
Volume1
StatePublished - Dec 1 1997

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