Aluminum particle formation in the gas phase of a low pressure chemical vapor deposition reactor using dimethylethylamine alane (AlH3) as a precursor

Michael G. Simmonds, Wayne L. Gladfelter, Haojiang Li, Peter H. McMurry

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

10 Scopus citations

Fingerprint

Dive into the research topics of 'Aluminum particle formation in the gas phase of a low pressure chemical vapor deposition reactor using dimethylethylamine alane (AlH3) as a precursor'. Together they form a unique fingerprint.

Engineering & Materials Science

Physics & Astronomy

Chemical Compounds