Anhydrous metal nitrates as volatile single source precursors for the CVD of metal oxide films

Daniel G. Colombo, David C. Gilmer, Victor G. Young, Stephen A. Campbell, Wayne L. Gladfelter

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

Anhydrous metal nitrates exhibit the volatility and reactivity necessary for chemical vapor deposition (CVD) applications. With the obvious absence of any carbon and hydrogen, and the presence of an intrinsic oxidant in the form of the nitrate ligand, anhydrous metal nitrates represent a useful class of single-source precursors for the CVD of metal oxide films.

Original languageEnglish (US)
Pages (from-to)220-222
Number of pages3
JournalAdvanced Materials
Volume10
Issue number17
StatePublished - Dec 1 1998

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