Atomic layer deposition of Al-doped ZnO films using ozone as the oxygen source: A comparison of two methods to deliver aluminum

Engineering & Materials Science

• Atomic layer deposition 100%
• Ozone 82%
• Oxygen 52%
• Aluminum 50%
• Optical properties 27%
• Electric properties 23%
• Chemical analysis 14%
• Partial pressure 12%
• Structural properties 11%
• Carbon 8%
• Microstructure 7%
• Water 5%

Physics & Astronomy

• ozone 71%
• atomic layer epitaxy 67%
• aluminum 44%
• oxygen 39%
• electrical properties 15%
• cycles 14%
• optical properties 14%
• Auger spectroscopy 10%
• electron spectroscopy 10%
• partial pressure 10%
• surface layers 9%
• carbon 7%
• microstructure 6%
• water 6%
• profiles 5%

Chemical Compounds

• Atomic Layer Epitaxy 75%
• Dioxygen 31%
• Liquid Film 31%
• Diethylzinc 27%
• Electrical Property 18%
• Optical Property 15%
• Auger Electron Spectroscopy 12%
• Partial Pressure 10%
• Microstructure 7%
• Carbon Atom 5%
• Surface 3%