Atomic layer lithography of wafer-scale nanogap arrays for extreme confinement of electromagnetic waves

Xiaoshu Chen, Hyeong Ryeol Park, Matthew Pelton, Xianji Piao, Nathan C. Lindquist, Hyungsoon Im, Yun Jung Kim, Jae Sung Ahn, Kwang Jun Ahn, Namkyoo Park, Dai Sik Kim, Sang Hyun Oh

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