Behavior of dual ion beam sputtered MgZnO thin films for different oxygen partial pressure

Engineering & Materials Science

• Ion beams 100%
• Partial pressure 83%
• Thin films 66%
• Oxygen 57%
• Structural properties 25%
• Electric properties 25%
• Growth temperature 18%
• Crystal orientation 16%
• Sputtering 15%
• Electrons 11%
• X ray diffraction 11%
• Substrates 8%
• Temperature 4%

Chemical Compounds

• Ion Beam 77%
• Partial Pressure 67%
• Dioxygen 34%
• Liquid Film 22%
• Electrical Property 19%
• Ion Beam Sputtering 18%
• Chemical Element 18%
• Crystal Orientation 14%
• Raman Intensity 14%
• Electron Mobility 14%
• Phonon 13%
• Polycrystalline Solid 10%
• Raman Spectrum 9%
• Ambient Reaction Temperature 6%
• Electron Particle 6%
• X-Ray Diffraction 5%

Physics & Astronomy

• partial pressure 68%
• ion beams 54%
• oxygen 42%
• thin films 36%
• electrical properties 20%
• hypoxia 17%
• electron mobility 14%
• wurtzite 14%
• sputtering 11%
• Raman spectra 10%
• phonons 9%
• electrical resistivity 8%
• room temperature 7%
• diffraction 7%
• crystals 6%
• x rays 6%
• electrons 5%
• temperature 4%