Binding state and microstructure analyses of Co-doped TiO 2 thin film

X. F. Yao; T. J. Zhou; Y. X. Gai; T. C. Chong; J. P. Wang

doi:10.1063/1.1689432

Binding state and microstructure analyses of Co-doped TiO ₂ thin film

X. F. Yao, T. J. Zhou, Y. X. Gai, T. C. Chong, J. P. Wang

Electrical and Computer Engineering

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

The binding state, microstructure and diffusion behavior of multilayered Co-doped TiO ₂ thin film were investigated, using x-ray photoelectron spectroscopy and transmission electron microscopy (TEM). The magnetron sputtering method was used for the deposition of thin films on a LaAlO ₃ (001) single crystal substrate, at room temperature. Postannealing treatment in an ultrahigh vacuum system was used for the diffusion of Co atoms into TiO ₂. The results from TEM patterns show that the annealed films exhibit a polycrystalline rutile-TiO ₂ phase.

Original language	English (US)
Pages (from-to)	7375-7377
Number of pages	3
Journal	Journal of Applied Physics
Volume	95
Issue number	11 II
DOIs	https://doi.org/10.1063/1.1689432
State	Published - Jun 1 2004

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abstract = "The binding state, microstructure and diffusion behavior of multilayered Co-doped TiO 2 thin film were investigated, using x-ray photoelectron spectroscopy and transmission electron microscopy (TEM). The magnetron sputtering method was used for the deposition of thin films on a LaAlO 3 (001) single crystal substrate, at room temperature. Postannealing treatment in an ultrahigh vacuum system was used for the diffusion of Co atoms into TiO 2. The results from TEM patterns show that the annealed films exhibit a polycrystalline rutile-TiO 2 phase.",

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AU - Yao, X. F.

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AU - Gai, Y. X.

AU - Chong, T. C.

AU - Wang, J. P.

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N2 - The binding state, microstructure and diffusion behavior of multilayered Co-doped TiO 2 thin film were investigated, using x-ray photoelectron spectroscopy and transmission electron microscopy (TEM). The magnetron sputtering method was used for the deposition of thin films on a LaAlO 3 (001) single crystal substrate, at room temperature. Postannealing treatment in an ultrahigh vacuum system was used for the diffusion of Co atoms into TiO 2. The results from TEM patterns show that the annealed films exhibit a polycrystalline rutile-TiO 2 phase.

AB - The binding state, microstructure and diffusion behavior of multilayered Co-doped TiO 2 thin film were investigated, using x-ray photoelectron spectroscopy and transmission electron microscopy (TEM). The magnetron sputtering method was used for the deposition of thin films on a LaAlO 3 (001) single crystal substrate, at room temperature. Postannealing treatment in an ultrahigh vacuum system was used for the diffusion of Co atoms into TiO 2. The results from TEM patterns show that the annealed films exhibit a polycrystalline rutile-TiO 2 phase.

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Binding state and microstructure analyses of Co-doped TiO ₂ thin film

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