Block copolymer lithography

Christopher M. Bates; Michael J. Maher; Dustin W. Janes; Christopher J. Ellison; C. Grant Willson

doi:10.1021/ma401762n

Block copolymer lithography

Christopher M. Bates, Michael J. Maher, Dustin W. Janes, Christopher J. Ellison, C. Grant Willson

Chemical Engineering and Materials Science

Research output: Contribution to journal › Review article › peer-review

541 Scopus citations

Abstract

This Perspective addresses the current state of block copolymer lithography and identifies key challenges and opportunities within the field. Significant strides in experimental and theoretical thin film research have nucleated the transition of block copolymers "from lab to fab", but outstanding questions remain about the optimal materials, processes, and analytical techniques for first-generation devices and beyond. Particular attention herein is focused on advances and issues related to thermal annealing. Block copolymers are poised to change the traditional lithographic resolution enhancement paradigm from "top-down" to "bottom-up".

Original language	English (US)
Pages (from-to)	2-12
Number of pages	11
Journal	Macromolecules
Volume	47
Issue number	1
DOIs	https://doi.org/10.1021/ma401762n
State	Published - Jan 14 2014

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title = "Block copolymer lithography",

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AU - Maher, Michael J.

AU - Janes, Dustin W.

AU - Ellison, Christopher J.

AU - Willson, C. Grant

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Block copolymer lithography

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