Abstract
Directed self-assembly of Si containing block copolymers (BCP) is a candidate for next generation patterning technology because it enables both high resolution and high etch contrast. Achieving high resolution requires a high χ parameter. However, it is often difficult to achieve perpendicular patterns by thermal annealing of BCPs with a lower surface energy block, which tends to align with the air interface. New top surface treatment materials that provide a surface energy between those of the blocks have been developed that enable perpendicular pattern alignment with block copolymers that have a low surface energy block.
Original language | English (US) |
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Pages (from-to) | 125-130 |
Number of pages | 6 |
Journal | Journal of Photopolymer Science and Technology |
Volume | 25 |
Issue number | 1 |
DOIs | |
State | Published - 2012 |
Keywords
- Directed self assembly
- Si-containing block copolymer
- Top-coat