Broadband optical antireflection enhancement by integrating antireflective nanoislands with silicon nanoconical-frustum arrays

Haesung Park; Dongheok Shin; Gumin Kang; Seunghwa Baek; Kyoungsik Kim; Willie J. Padilla

doi:10.1002/adma.201103399

Broadband optical antireflection enhancement by integrating antireflective nanoislands with silicon nanoconical-frustum arrays

Haesung Park, Dongheok Shin, Gumin Kang, Seunghwa Baek, Kyoungsik Kim, Willie J. Padilla

Research output: Contribution to journal › Article › peer-review

99 Scopus citations

Abstract

Based on conventional colloidal nanosphere lithography, we experimentally demonstrate novel graded-index nanostructures for broadband optical antireflection enhancement including the near-ultraviolet (NUV) region by integrating residual polystyrene antireflective (AR) nanoislands coating arrays with silicon nano-conical-frustum arrays. This is a feasible optimized integration method of two major approaches for antireflective surfaces: quarter-wavelength AR coating and biomimetic moth's eye structure.

Original language	English (US)
Pages (from-to)	5796-5800
Number of pages	5
Journal	Advanced Materials
Volume	23
Issue number	48
DOIs	https://doi.org/10.1002/adma.201103399
State	Published - Dec 22 2011
Externally published	Yes

Keywords

lithography
metamaterials
nanostructures
photonic crystals
self-assembly

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AU - Park, Haesung

AU - Shin, Dongheok

AU - Kang, Gumin

AU - Baek, Seunghwa

AU - Kim, Kyoungsik

AU - Padilla, Willie J.

PY - 2011/12/22

Y1 - 2011/12/22

N2 - Based on conventional colloidal nanosphere lithography, we experimentally demonstrate novel graded-index nanostructures for broadband optical antireflection enhancement including the near-ultraviolet (NUV) region by integrating residual polystyrene antireflective (AR) nanoislands coating arrays with silicon nano-conical-frustum arrays. This is a feasible optimized integration method of two major approaches for antireflective surfaces: quarter-wavelength AR coating and biomimetic moth's eye structure.

AB - Based on conventional colloidal nanosphere lithography, we experimentally demonstrate novel graded-index nanostructures for broadband optical antireflection enhancement including the near-ultraviolet (NUV) region by integrating residual polystyrene antireflective (AR) nanoislands coating arrays with silicon nano-conical-frustum arrays. This is a feasible optimized integration method of two major approaches for antireflective surfaces: quarter-wavelength AR coating and biomimetic moth's eye structure.

KW - lithography

KW - metamaterials

KW - nanostructures

KW - photonic crystals

KW - self-assembly

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JO - Advanced Materials

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Broadband optical antireflection enhancement by integrating antireflective nanoislands with silicon nanoconical-frustum arrays

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