Chemical Vapor Deposition of Aluminum

Michael G. Simmonds, Wayne L Gladfelter

Research output: Chapter in Book/Report/Conference proceedingChapter

1 Scopus citations

Abstract

Films of metallic aluminum are utilized widely in several industries. We will begin this chapter with a brief summary of these and focus on some of the critical physical properties required by these diverse applications. An association between these physical properties and the microstructure of the film will be made whenever possible. Following a general comparison between physical and chemical vapor deposition processes, we highlight some general features of CVD and their relationship to film stucture. The majority of the chapter will summarize the literature describing the CVD of A1.

Original languageEnglish (US)
Title of host publicationThe Chemistry of Metal CVD
PublisherWiley-VCH Verlag
Pages45-103
Number of pages59
ISBN (Electronic)9783527615858
ISBN (Print)3527290710, 9783527290710
DOIs
StatePublished - Dec 26 2007

Keywords

  • Alane precursors
  • Applications of aluminum films
  • Physical vapor deposition
  • Surface diffusion
  • Triisobutylaluminum

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