Chemical vapor deposition of diamond films in an atmospheric-pressure induction plasma

Chiahung Li, Y. C. Lau, S. L. Girshick

Research output: Chapter in Book/Report/Conference proceedingConference contribution

Abstract

Polycrystalline diamond films were deposited on molybdenum substrates in an atmospheric-pressure radio-frequency induction plasma. The plasma consisted of argon into which hydrogen and methane were coaxially injected. The hydrogen-methane jet impinged in stagnation-point flow upon a water-cooled substrate located downstream of the induction coils. A series of eight experiments investigated the effect of five operating parameters. Deposited films were characterized by scanning electron microscopy, Raman spectroscopy, and x-ray diffraction. Each set of parameters was found to yield a particular crystal morphology with good reproducibility. The major correlation found was for the effect of the methane-hydrogen ratio. Regardless of the value of other parameters, well-faceted crystals were always obtained when the ratio equalled 1%, whereas cauliflower or ball-like structures were always obtained with a 5% methane-hydrogen ratio.

Original languageEnglish (US)
Title of host publicationHeat Transfer in Thermal Plasma Processing
PublisherPubl by ASME
Pages15-19
Number of pages5
ISBN (Print)0791807304
StatePublished - Jan 1 1991
Event28th National Heat Transfer Conference - Minneapolis, MN, USA
Duration: Jul 28 1991Jul 31 1991

Publication series

NameAmerican Society of Mechanical Engineers, Heat Transfer Division, (Publication) HTD
Volume161
ISSN (Print)0272-5673

Other

Other28th National Heat Transfer Conference
CityMinneapolis, MN, USA
Period7/28/917/31/91

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