Chemical Vapor Deposition of Ruthenium and Osmium Thin Films Using (Hexafluoro-2-butyne)tetracarbonylruthenium and -osmium

Engineering & Materials Science

• Osmium 100%
• Ruthenium 80%
• Chemical vapor deposition 61%
• Thin films 50%
• X ray photoelectron spectroscopy 32%
• Gases 30%
• X ray diffraction 26%
• Metal complexes 21%
• Vapor pressure 16%
• Temperature 10%
• Scanning electron microscopy 10%
• Microstructure 8%

Chemical Compounds

• Chemical Vapour Deposition 47%
• Gas 28%
• Liquid Film 25%
• Grain Size 24%
• Polycrystalline Solid 23%
• X-Ray Photoelectron Spectroscopy 18%
• Vapor Deposition Process 16%
• Auger Electron Spectroscopy 15%
• X-Ray Diffraction 13%
• Vapor Pressure 13%
• Microstructure 8%
• Scanning Electron Microscopy 7%
• Purity 6%
• Metal 5%