TY - JOUR
T1 - Cold Atmospheric Pressure Plasma VUV Interactions With Surfaces
T2 - Effect of Local Gas Environment and Source Design
AU - Knoll, Andrew J.
AU - Luan, Pingshan
AU - Bartis, Elliot A.J.
AU - Kondeti, Vighneswara S.S.K.
AU - Bruggeman, Peter J.
AU - Oehrlein, Gottlieb S.
N1 - Publisher Copyright:
© 2016 WILEY-VCH Verlag GmbH & Co. KGaA, Weinheim
PY - 2016/11/1
Y1 - 2016/11/1
N2 - This study uses photoresist materials in combination with several optical filters as a diagnostic to examine the relative importance of VUV-induced surface modifications for different cold atmospheric pressure plasma (CAPP) sources. The argon fed kHz-driven ring-APPJ showed the largest ratio of VUV surface modification relative to the total modification introduced, whereas the MHz APPJ showed the largest overall surface modification. The MHz APPJ shows increased total thickness reduction and reduced VUV effect as oxygen is added to the feed gas, a condition that is often used for practical applications. We examine the influence of noble gas flow from the APPJ on the local environment. The local environment has a decisive impact on polymer modification from VUV emission as O2 readily absorbs VUV photons.
AB - This study uses photoresist materials in combination with several optical filters as a diagnostic to examine the relative importance of VUV-induced surface modifications for different cold atmospheric pressure plasma (CAPP) sources. The argon fed kHz-driven ring-APPJ showed the largest ratio of VUV surface modification relative to the total modification introduced, whereas the MHz APPJ showed the largest overall surface modification. The MHz APPJ shows increased total thickness reduction and reduced VUV effect as oxygen is added to the feed gas, a condition that is often used for practical applications. We examine the influence of noble gas flow from the APPJ on the local environment. The local environment has a decisive impact on polymer modification from VUV emission as O2 readily absorbs VUV photons.
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U2 - 10.1002/ppap.201600043
DO - 10.1002/ppap.201600043
M3 - Article
AN - SCOPUS:84982993429
SN - 1612-8850
VL - 13
SP - 1067
EP - 1077
JO - Plasma Processes and Polymers
JF - Plasma Processes and Polymers
IS - 11
ER -