Composite nanocrystalline/amorphous thin films for particle detector applications

Research output: Chapter in Book/Report/Conference proceedingConference contribution

1 Scopus citations

Abstract

Thin films of amorphous silicon with nanocrystalline silicon inclusions are fabricated using a dual plasma PECVD co-deposition system. Raman spectroscopy and X-ray diffraction confirmed the crystallinity of the embedded nanocrystals as well as their diameter, which is varied from 4.3 nm to 17.5 nm. The dark conductivity of the films is highly dependent on the crystal fraction, with a maximum room temperature conductivity found for a crystal concentration of 5.5%, well below the percolation threshold. Proton irradiation at energies of 217 MeV with a total fluence of 5 × 1012 protons/cm2 caused no significant radiation damage. The enhancement of the conductivity, along with the absence of radiation damage suggests this material may be a candidate for use in the next generation of particle detectors in the Compact Muon Solenoid in the Large Hadron Collider at CERN.

Original languageEnglish (US)
Title of host publicationEmerging Silicon Science and Technology
EditorsRueben Collins, Zachary Holman, Akira Terakawa, Paul Stradins, Bahman Hekmatshoar
PublisherMaterials Research Society
Pages49-54
Number of pages6
ISBN (Electronic)9781510826267
DOIs
StatePublished - Jan 1 2015
Event2015 MRS Spring Meeting - San Francisco, United States
Duration: Apr 6 2015Apr 10 2015

Publication series

NameMaterials Research Society Symposium Proceedings
Volume1770
ISSN (Print)0272-9172

Other

Other2015 MRS Spring Meeting
CountryUnited States
CitySan Francisco
Period4/6/154/10/15

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