Dependence of ordering kinetics of FePt thin films on different substrates

C. L. Zha; S. H. He; B. Ma; Z. Z. Zhang; F. X. Gan; Q. Y. Jin

doi:10.1109/TMAG.2008.2001609

Dependence of ordering kinetics of FePt thin films on different substrates

C. L. Zha, S. H. He, B. Ma, Z. Z. Zhang, F. X. Gan, Q. Y. Jin

Electrical and Computer Engineering

Research output: Contribution to journal › Article › peer-review

9 Scopus citations

Abstract

FePt thin films are deposited on SrTiO₃, MgO, and a 2 nm-FeO_x underlayer on an Si substrate at room temperature and then annealed at elevated temperatures. Studies of the L1₀ ordering process in each case show that the ordering temperature for the FePt film on the nonepitaxial Si/FeO_x substrate is ∼150 °C lower than the epitaxial FePt films deposited on MgO and SrTiO₃ substrates. We argue that internal stresses arising from lattice defects and a recrystallizing process as well as thermal strain from differences in thermal expansion between substrate and film are responsible for the differences in ordering kinetics from the A1 to L1₀ phase of FePt on the various substrates.

Original language	English (US)
Pages (from-to)	3539-3542
Number of pages	4
Journal	IEEE Transactions on Magnetics
Volume	44
Issue number	11 PART 2
DOIs	https://doi.org/10.1109/TMAG.2008.2001609
State	Published - Nov 2008

Bibliographical note

Funding Information:
The first author would like to thank Dr. B. Lu of Seagate Research for helpful discussions. The authors would like to thank Dr. J. Åkerman for carefully reading this manuscript and the reviewer(s) for modifying this manuscript thoroughly. This work was supported in part by the National Nature Science Foundation under Grant 60490290 and Grant 60678008 from the Science and Technology Committee of Shanghai under Grant 06DJ14007.

Keywords

Epitaxial growth
FePt
Nonepitaxial growth
Ordering kinetics

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@article{6c28578e8b3c4bb18c6c47eddf455e58,

title = "Dependence of ordering kinetics of FePt thin films on different substrates",

abstract = "FePt thin films are deposited on SrTiO3, MgO, and a 2 nm-FeOx underlayer on an Si substrate at room temperature and then annealed at elevated temperatures. Studies of the L10 ordering process in each case show that the ordering temperature for the FePt film on the nonepitaxial Si/FeOx substrate is ∼150 °C lower than the epitaxial FePt films deposited on MgO and SrTiO3 substrates. We argue that internal stresses arising from lattice defects and a recrystallizing process as well as thermal strain from differences in thermal expansion between substrate and film are responsible for the differences in ordering kinetics from the A1 to L10 phase of FePt on the various substrates.",

keywords = "Epitaxial growth, FePt, Nonepitaxial growth, Ordering kinetics",

author = "Zha, {C. L.} and He, {S. H.} and B. Ma and Zhang, {Z. Z.} and Gan, {F. X.} and Jin, {Q. Y.}",

note = "Funding Information: The first author would like to thank Dr. B. Lu of Seagate Research for helpful discussions. The authors would like to thank Dr. J. {\AA}kerman for carefully reading this manuscript and the reviewer(s) for modifying this manuscript thoroughly. This work was supported in part by the National Nature Science Foundation under Grant 60490290 and Grant 60678008 from the Science and Technology Committee of Shanghai under Grant 06DJ14007.",

year = "2008",

month = nov,

doi = "10.1109/TMAG.2008.2001609",

language = "English (US)",

volume = "44",

pages = "3539--3542",

journal = "IEEE Transactions on Magnetics",

issn = "0018-9464",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

number = "11 PART 2",

}

TY - JOUR

T1 - Dependence of ordering kinetics of FePt thin films on different substrates

AU - Zha, C. L.

AU - He, S. H.

AU - Ma, B.

AU - Zhang, Z. Z.

AU - Gan, F. X.

AU - Jin, Q. Y.

N1 - Funding Information: The first author would like to thank Dr. B. Lu of Seagate Research for helpful discussions. The authors would like to thank Dr. J. Åkerman for carefully reading this manuscript and the reviewer(s) for modifying this manuscript thoroughly. This work was supported in part by the National Nature Science Foundation under Grant 60490290 and Grant 60678008 from the Science and Technology Committee of Shanghai under Grant 06DJ14007.

PY - 2008/11

Y1 - 2008/11

N2 - FePt thin films are deposited on SrTiO3, MgO, and a 2 nm-FeOx underlayer on an Si substrate at room temperature and then annealed at elevated temperatures. Studies of the L10 ordering process in each case show that the ordering temperature for the FePt film on the nonepitaxial Si/FeOx substrate is ∼150 °C lower than the epitaxial FePt films deposited on MgO and SrTiO3 substrates. We argue that internal stresses arising from lattice defects and a recrystallizing process as well as thermal strain from differences in thermal expansion between substrate and film are responsible for the differences in ordering kinetics from the A1 to L10 phase of FePt on the various substrates.

AB - FePt thin films are deposited on SrTiO3, MgO, and a 2 nm-FeOx underlayer on an Si substrate at room temperature and then annealed at elevated temperatures. Studies of the L10 ordering process in each case show that the ordering temperature for the FePt film on the nonepitaxial Si/FeOx substrate is ∼150 °C lower than the epitaxial FePt films deposited on MgO and SrTiO3 substrates. We argue that internal stresses arising from lattice defects and a recrystallizing process as well as thermal strain from differences in thermal expansion between substrate and film are responsible for the differences in ordering kinetics from the A1 to L10 phase of FePt on the various substrates.

KW - Epitaxial growth

KW - FePt

KW - Nonepitaxial growth

KW - Ordering kinetics

UR - http://www.scopus.com/inward/record.url?scp=77955152113&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=77955152113&partnerID=8YFLogxK

U2 - 10.1109/TMAG.2008.2001609

DO - 10.1109/TMAG.2008.2001609

M3 - Article

AN - SCOPUS:77955152113

VL - 44

SP - 3539

EP - 3542

JO - IEEE Transactions on Magnetics

JF - IEEE Transactions on Magnetics

SN - 0018-9464

IS - 11 PART 2

ER -

Dependence of ordering kinetics of FePt thin films on different substrates

Abstract

Bibliographical note

Keywords

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