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Effect of elevated implant temperature on amorphization and activation in as-implanted silicon-on-insulator layers
Katherine L. Saenger, Stephen W. Bedell, Matthew Copel, Amlan Majumdar, John A. Ott, Joel P. De Souza, Steven J. Koester, Donald R. Wall, Devendra K. Sadana
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution