Effect of growth temperature on structural, electrical and optical properties of dual ion beam sputtered ZnO thin films

Engineering & Materials Science

• Growth temperature 100%
• Ion beams 87%
• Optical properties 77%
• Structural properties 67%
• Electric properties 65%
• Thin films 58%
• Point defects 38%
• Substrates 26%
• Photoluminescence 20%
• Oxygen 20%
• Epitaxial films 18%
• Full width at half maximum 18%
• Vacancies 16%
• Sputtering 15%
• X ray photoelectron spectroscopy 15%
• Temperature 14%
• Surface morphology 13%
• Crystalline materials 13%
• X ray diffraction 12%
• Gases 7%

Chemical Compounds

• Ion Beam 68%
• Electrical Property 52%
• Optical Property 45%
• Crystal Point Defect 31%
• Liquid Film 29%
• Emission Peak 26%
• Ion Beam Sputtering 19%
• Interstitial 13%
• Dioxygen 12%
• Photoluminescence 9%
• X-Ray Photoelectron Spectroscopy 8%
• Pressure 7%
• Ambient Reaction Temperature 6%
• Gas 6%
• X-Ray Diffraction 6%
• Surface 3%

Physics & Astronomy

• ion beams 48%
• electrical properties 45%
• optical properties 40%
• thin films 31%
• point defects 23%
• temperature 18%
• pressure chambers 15%
• oxygen 14%
• x rays 11%
• interstitials 10%
• photoelectron spectroscopy 10%
• sputtering 9%
• photoluminescence 8%
• conduction 8%
• electrical resistivity 7%
• room temperature 6%
• diffraction 6%
• gases 6%