TY - JOUR
T1 - Electrohydrodynamic instabilities in thin viscoelastic films - AC and DC fields
AU - Espín, Leonardo
AU - Corbett, Andrew
AU - Kumar, Satish
PY - 2013/6/1
Y1 - 2013/6/1
N2 - Electrohydrodynamic instabilities in thin liquid films are a promising route for the self-assembly of well-defined topographical features on the surfaces of materials. Here, we study the effect of viscoelasticity on these instabilities under the influence of AC and DC electric fields. Viscoelasticity is incorporated via a Jeffreys model, and both perfect and leaky dielectric materials are considered. In the case of DC fields, asymptotic methods are employed to shed light on the nature of a singularity that arises when solvent viscosity is neglected (i.e., the Maxwell-fluid limit). In the case of AC fields, we apply a numerical procedure based on Floquet theory to determine the maximum growth rate and corresponding wave number as a function of the oscillation amplitude and frequency. Elasticity is found to increase both the maximum growth rate and corresponding wave number, with the effects being most pronounced when the oscillation period is comparable to the fluid relaxation time.
AB - Electrohydrodynamic instabilities in thin liquid films are a promising route for the self-assembly of well-defined topographical features on the surfaces of materials. Here, we study the effect of viscoelasticity on these instabilities under the influence of AC and DC electric fields. Viscoelasticity is incorporated via a Jeffreys model, and both perfect and leaky dielectric materials are considered. In the case of DC fields, asymptotic methods are employed to shed light on the nature of a singularity that arises when solvent viscosity is neglected (i.e., the Maxwell-fluid limit). In the case of AC fields, we apply a numerical procedure based on Floquet theory to determine the maximum growth rate and corresponding wave number as a function of the oscillation amplitude and frequency. Elasticity is found to increase both the maximum growth rate and corresponding wave number, with the effects being most pronounced when the oscillation period is comparable to the fluid relaxation time.
KW - Electrohydrodynamics
KW - Instability
KW - Thin films
KW - Viscoelasticity
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U2 - 10.1016/j.jnnfm.2012.12.013
DO - 10.1016/j.jnnfm.2012.12.013
M3 - Article
AN - SCOPUS:84875788196
VL - 196
SP - 102
EP - 111
JO - Journal of Non-Newtonian Fluid Mechanics
JF - Journal of Non-Newtonian Fluid Mechanics
SN - 0377-0257
ER -