Enhanced Electrical Resistivity and Properties via Ion Bombardment of Ferroelectric Thin Films

Sahar Saremi; Ruijuan Xu; Liv R. Dedon; Julia A. Mundy; Shang Lin Hsu; Zuhuang Chen; Anoop R. Damodaran; Scott P. Chapman; Joseph T. Evans; Lane W. Martin

doi:10.1002/adma.201603968

Enhanced Electrical Resistivity and Properties via Ion Bombardment of Ferroelectric Thin Films

Sahar Saremi, Ruijuan Xu, Liv R. Dedon, Julia A. Mundy, Shang Lin Hsu, Zuhuang Chen, Anoop R. Damodaran, Scott P. Chapman, Joseph T. Evans, Lane W. Martin

Research output: Contribution to journal › Article › peer-review

52 Scopus citations

Original language	English (US)
Pages (from-to)	10750-10756
Number of pages	7
Journal	Advanced Materials
Volume	28
Issue number	48
DOIs	https://doi.org/10.1002/adma.201603968
State	Published - Dec 2016
Externally published	Yes

Bibliographical note

Funding Information:
S.S. acknowledges support from the National Science Foundation under grant CMMI-1434147. R.X. acknowledges support from the National Science Foundation under grant DMR-1451219. L.R.D. acknowledges support from the U.S. Department of Energy, Office of Basic Sciences under grant no. DE-SC0012375 for chemical analysis of the films. Z.C. acknowledges support from the Air Force Office of Scientific Research under grant FA9550-12-1-0471 and from the Laboratory Directed Research and Development Program of Lawrence Berkeley National Laboratory under U.S. Department of Energy Contract No. DE-AC02-05CH11231 for the development of advanced synthesis methods. A.R.D. acknowledges support from the Army Research Office under grant W911NF-14-1-0104. L.W.M. acknowledges support from the National Science Foundation under grant OISE-1545907. Work at the Molecular Foundry and the National Center for Electron Microscopy was supported by the Office of Science, Office of Basic Energy Sciences, of the U.S. Department of Energy under Contract No. DE-AC02-05CH11231.

Keywords

electrical resistivity
ferroelectric
ion bombardment
lead titanate
thin films

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title = "Enhanced Electrical Resistivity and Properties via Ion Bombardment of Ferroelectric Thin Films",

keywords = "electrical resistivity, ferroelectric, ion bombardment, lead titanate, thin films",

author = "Sahar Saremi and Ruijuan Xu and Dedon, {Liv R.} and Mundy, {Julia A.} and Hsu, {Shang Lin} and Zuhuang Chen and Damodaran, {Anoop R.} and Chapman, {Scott P.} and Evans, {Joseph T.} and Martin, {Lane W.}",

note = "Funding Information: S.S. acknowledges support from the National Science Foundation under grant CMMI-1434147. R.X. acknowledges support from the National Science Foundation under grant DMR-1451219. L.R.D. acknowledges support from the U.S. Department of Energy, Office of Basic Sciences under grant no. DE-SC0012375 for chemical analysis of the films. Z.C. acknowledges support from the Air Force Office of Scientific Research under grant FA9550-12-1-0471 and from the Laboratory Directed Research and Development Program of Lawrence Berkeley National Laboratory under U.S. Department of Energy Contract No. DE-AC02-05CH11231 for the development of advanced synthesis methods. A.R.D. acknowledges support from the Army Research Office under grant W911NF-14-1-0104. L.W.M. acknowledges support from the National Science Foundation under grant OISE-1545907. Work at the Molecular Foundry and the National Center for Electron Microscopy was supported by the Office of Science, Office of Basic Energy Sciences, of the U.S. Department of Energy under Contract No. DE-AC02-05CH11231.",

year = "2016",

month = dec,

doi = "10.1002/adma.201603968",

language = "English (US)",

volume = "28",

pages = "10750--10756",

journal = "Advanced Materials",

issn = "0935-9648",

publisher = "Wiley-VCH Verlag",

number = "48",

}

TY - JOUR

T1 - Enhanced Electrical Resistivity and Properties via Ion Bombardment of Ferroelectric Thin Films

AU - Saremi, Sahar

AU - Xu, Ruijuan

AU - Dedon, Liv R.

AU - Mundy, Julia A.

AU - Hsu, Shang Lin

AU - Chen, Zuhuang

AU - Damodaran, Anoop R.

AU - Chapman, Scott P.

AU - Evans, Joseph T.

AU - Martin, Lane W.

N1 - Funding Information: S.S. acknowledges support from the National Science Foundation under grant CMMI-1434147. R.X. acknowledges support from the National Science Foundation under grant DMR-1451219. L.R.D. acknowledges support from the U.S. Department of Energy, Office of Basic Sciences under grant no. DE-SC0012375 for chemical analysis of the films. Z.C. acknowledges support from the Air Force Office of Scientific Research under grant FA9550-12-1-0471 and from the Laboratory Directed Research and Development Program of Lawrence Berkeley National Laboratory under U.S. Department of Energy Contract No. DE-AC02-05CH11231 for the development of advanced synthesis methods. A.R.D. acknowledges support from the Army Research Office under grant W911NF-14-1-0104. L.W.M. acknowledges support from the National Science Foundation under grant OISE-1545907. Work at the Molecular Foundry and the National Center for Electron Microscopy was supported by the Office of Science, Office of Basic Energy Sciences, of the U.S. Department of Energy under Contract No. DE-AC02-05CH11231.

PY - 2016/12

Y1 - 2016/12

KW - electrical resistivity

KW - ferroelectric

KW - ion bombardment

KW - lead titanate

KW - thin films

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U2 - 10.1002/adma.201603968

DO - 10.1002/adma.201603968

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VL - 28

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EP - 10756

JO - Advanced Materials

JF - Advanced Materials

IS - 48

ER -

Enhanced Electrical Resistivity and Properties via Ion Bombardment of Ferroelectric Thin Films

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Keywords

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