Enhanced Electrical Resistivity and Properties via Ion Bombardment of Ferroelectric Thin Films

Sahar Saremi, Ruijuan Xu, Liv R. Dedon, Julia A. Mundy, Shang Lin Hsu, Zuhuang Chen, Anoop R. Damodaran, Scott P. Chapman, Joseph T. Evans, Lane W. Martin

Research output: Contribution to journalArticlepeer-review

25 Scopus citations
Original languageEnglish (US)
Pages (from-to)10750-10756
Number of pages7
JournalAdvanced Materials
Volume28
Issue number48
DOIs
StatePublished - Dec 2016
Externally publishedYes

Bibliographical note

Funding Information:
S.S. acknowledges support from the National Science Foundation under grant CMMI-1434147. R.X. acknowledges support from the National Science Foundation under grant DMR-1451219. L.R.D. acknowledges support from the U.S. Department of Energy, Office of Basic Sciences under grant no. DE-SC0012375 for chemical analysis of the films. Z.C. acknowledges support from the Air Force Office of Scientific Research under grant FA9550-12-1-0471 and from the Laboratory Directed Research and Development Program of Lawrence Berkeley National Laboratory under U.S. Department of Energy Contract No. DE-AC02-05CH11231 for the development of advanced synthesis methods. A.R.D. acknowledges support from the Army Research Office under grant W911NF-14-1-0104. L.W.M. acknowledges support from the National Science Foundation under grant OISE-1545907. Work at the Molecular Foundry and the National Center for Electron Microscopy was supported by the Office of Science, Office of Basic Energy Sciences, of the U.S. Department of Energy under Contract No. DE-AC02-05CH11231.

Keywords

  • electrical resistivity
  • ferroelectric
  • ion bombardment
  • lead titanate
  • thin films

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