Abstract
Interfaces are generally weaker in terms of shearing and debonding in comparison to perfect grains since atoms within interfaces usually have low coordination bonds. In this letter, we report the experimental measurements of the shear strength of Cu-Nb interfaces by using quantitative ex situ and in situ indentations. The interface shear strength is estimated from experiments in the range of 0.3-0.55 GPa, which is consistent with atomistic simulations and evidence of the weak interface strengthening mechanisms in metallic multilayers.
Original language | English (US) |
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Pages (from-to) | 479-482 |
Number of pages | 4 |
Journal | Scripta Materialia |
Volume | 67 |
Issue number | 5 |
DOIs | |
State | Published - Sep 2012 |
Externally published | Yes |
Bibliographical note
Funding Information:The research at Los Alamos National Laboratory is supported by DOE, Office of Science, Basic Energy Sciences, Division of Materials Science and Engineering . J.W. acknowledges the support provided by Los Alamos National Laboratory Directed Research and Development project ER20110573 . In situ TEM and nanoindentation experiments were performed at the Center for Integrated Nanotechnologies, a DOE-BES supported national user facility. J.K. Baldwin is acknowledged for his technical assistance with films deposition. Sandia National Laboratories is a multi-program laboratory operated by Sandia Corporation, a wholly owned subsidiary of Lockheed Martin Company, for the U.S. Department of Energy’s National Nuclear Security Administration under contract DE-AC04-94AL85000.
Keywords
- Cu-Nb interface
- In situ indentation
- Multilayer
- Shear strength