This paper reports the use of SU-8 photoresist in the formation of an array of microcavities in polystyrene for biochemistry and combinatorial chemistry applications. Fabrication of the array involves hot embossing of polystyrene utilizing a nickel-cobalt micro-mold electroformed from the original SU-8 structure. For the particular applications being considered, the volume of the cavities necessitates a cavity depth of 100 microns. While conventional LIGA technology could be used, the use of a photoimageable spin-on layer capable of defining structures at a thickness well over 100 microns has greatly simplified the procedure. Additionally, such a method can put LIGA type processing in the hands of researchers without ready access to a synchrotron source. As such, this paper will cover the technical details of using SU-8 photoresist as it applies to the fabrication of a thermoplastic bio-MEMS structure.
|Original language||English (US)|
|Number of pages||3|
|Journal||Biennial University/Government/Industry Microelectronics Symposium - Proceedings|
|State||Published - Jan 1 1999|
|Event||Proceedings of the 1999 13th Biennial University / Goverment / Industry Microelectronics Symposium (UGIM) - Minneapolis, MN, USA|
Duration: Jun 20 1999 → Jun 23 1999