Fringe-field-activated SOI tilting mirrors

D. S. Greywall; Chien Shing Pai; Sang Hyun Oh; Chorng Ping Chang; D. M. Marom; S. Stanton; P. A. Busch; R. A. Cirelli; J. A. Taylor; F. P. Klemens; T. W. Sorsch; J. E. Bower; W. Y C Lai; H. T. Soh

doi:10.1109/OMEMS.2003.1233482

Fringe-field-activated SOI tilting mirrors

D. S. Greywall, Chien Shing Pai, Sang Hyun Oh, Chorng Ping Chang, D. M. Marom, S. Stanton, P. A. Busch, R. A. Cirelli, J. A. Taylor, F. P. Klemens, T. W. Sorsch, J. E. Bower, W. Y C Lai, H. T. Soh

Electrical and Computer Engineering

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Abstract

This paper discusses a significant improvement of the SOI process that can be implemented in various manners and that remedies many problems of earlier fabrication schemes. In particular the new MOEMS structures are monolithic, do not exhibit rotational snapdown, have electrical shielding between channels, and have activation voltages less than or comparable to parallel plate devices. The approach is discussed in terms of an application requiring a linear array of closely-spaced cantilever mirrors.

Original language	English (US)
Title of host publication	2003 IEEE/LEOS International Conference on Optical MEMS
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	91-92
Number of pages	2
ISBN (Electronic)	078037830X, 9780780378308
DOIs	https://doi.org/10.1109/OMEMS.2003.1233482
State	Published - Jan 1 2003
Event	2003 IEEE/LEOS International Conference on Optical MEMS - Waikoloa, United States Duration: Aug 18 2003 → Aug 21 2003

Publication series

Name	2003 IEEE/LEOS International Conference on Optical MEMS

Other

Other	2003 IEEE/LEOS International Conference on Optical MEMS
Country	United States
City	Waikoloa
Period	8/18/03 → 8/21/03

Keywords

Dielectric substrates
Electrodes
Electrostatics
Etching
Micromechanical devices
Mirrors
Research and development
Silicon
Springs
Voltage

Access

10.1109/OMEMS.2003.1233482

Fingerprint Dive into the research topics of 'Fringe-field-activated SOI tilting mirrors'. Together they form a unique fingerprint.

Cite this

Greywall, D. S., Pai, C. S., Oh, S. H., Chang, C. P., Marom, D. M., Stanton, S., Busch, P. A., Cirelli, R. A., Taylor, J. A., Klemens, F. P., Sorsch, T. W., Bower, J. E., Lai, W. Y. C., & Soh, H. T. (2003). Fringe-field-activated SOI tilting mirrors. In 2003 IEEE/LEOS International Conference on Optical MEMS (pp. 91-92). [1233482] (2003 IEEE/LEOS International Conference on Optical MEMS). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/OMEMS.2003.1233482

Fringe-field-activated SOI tilting mirrors. / Greywall, D. S.; Pai, Chien Shing; Oh, Sang Hyun; Chang, Chorng Ping; Marom, D. M.; Stanton, S.; Busch, P. A.; Cirelli, R. A.; Taylor, J. A.; Klemens, F. P.; Sorsch, T. W.; Bower, J. E.; Lai, W. Y C; Soh, H. T.

2003 IEEE/LEOS International Conference on Optical MEMS. Institute of Electrical and Electronics Engineers Inc., 2003. p. 91-92 1233482 (2003 IEEE/LEOS International Conference on Optical MEMS).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Greywall, DS, Pai, CS, Oh, SH, Chang, CP, Marom, DM, Stanton, S, Busch, PA, Cirelli, RA, Taylor, JA, Klemens, FP, Sorsch, TW, Bower, JE, Lai, WYC & Soh, HT 2003, Fringe-field-activated SOI tilting mirrors. in 2003 IEEE/LEOS International Conference on Optical MEMS., 1233482, 2003 IEEE/LEOS International Conference on Optical MEMS, Institute of Electrical and Electronics Engineers Inc., pp. 91-92, 2003 IEEE/LEOS International Conference on Optical MEMS, Waikoloa, United States, 8/18/03. https://doi.org/10.1109/OMEMS.2003.1233482

Greywall, D. S. ; Pai, Chien Shing ; Oh, Sang Hyun ; Chang, Chorng Ping ; Marom, D. M. ; Stanton, S. ; Busch, P. A. ; Cirelli, R. A. ; Taylor, J. A. ; Klemens, F. P. ; Sorsch, T. W. ; Bower, J. E. ; Lai, W. Y C ; Soh, H. T. / Fringe-field-activated SOI tilting mirrors. 2003 IEEE/LEOS International Conference on Optical MEMS. Institute of Electrical and Electronics Engineers Inc., 2003. pp. 91-92 (2003 IEEE/LEOS International Conference on Optical MEMS).

@inproceedings{4cb3744055984b099efa68ecc11916f1,

title = "Fringe-field-activated SOI tilting mirrors",

abstract = "This paper discusses a significant improvement of the SOI process that can be implemented in various manners and that remedies many problems of earlier fabrication schemes. In particular the new MOEMS structures are monolithic, do not exhibit rotational snapdown, have electrical shielding between channels, and have activation voltages less than or comparable to parallel plate devices. The approach is discussed in terms of an application requiring a linear array of closely-spaced cantilever mirrors.",

keywords = "Dielectric substrates, Electrodes, Electrostatics, Etching, Micromechanical devices, Mirrors, Research and development, Silicon, Springs, Voltage",

author = "Greywall, {D. S.} and Pai, {Chien Shing} and Oh, {Sang Hyun} and Chang, {Chorng Ping} and Marom, {D. M.} and S. Stanton and Busch, {P. A.} and Cirelli, {R. A.} and Taylor, {J. A.} and Klemens, {F. P.} and Sorsch, {T. W.} and Bower, {J. E.} and Lai, {W. Y C} and Soh, {H. T.}",

year = "2003",

month = jan,

day = "1",

doi = "10.1109/OMEMS.2003.1233482",

language = "English (US)",

series = "2003 IEEE/LEOS International Conference on Optical MEMS",

publisher = "Institute of Electrical and Electronics Engineers Inc.",

pages = "91--92",

booktitle = "2003 IEEE/LEOS International Conference on Optical MEMS",

note = "2003 IEEE/LEOS International Conference on Optical MEMS ; Conference date: 18-08-2003 Through 21-08-2003",

}

TY - GEN

T1 - Fringe-field-activated SOI tilting mirrors

AU - Greywall, D. S.

AU - Pai, Chien Shing

AU - Oh, Sang Hyun

AU - Chang, Chorng Ping

AU - Marom, D. M.

AU - Stanton, S.

AU - Busch, P. A.

AU - Cirelli, R. A.

AU - Taylor, J. A.

AU - Klemens, F. P.

AU - Sorsch, T. W.

AU - Bower, J. E.

AU - Lai, W. Y C

AU - Soh, H. T.

PY - 2003/1/1

Y1 - 2003/1/1

N2 - This paper discusses a significant improvement of the SOI process that can be implemented in various manners and that remedies many problems of earlier fabrication schemes. In particular the new MOEMS structures are monolithic, do not exhibit rotational snapdown, have electrical shielding between channels, and have activation voltages less than or comparable to parallel plate devices. The approach is discussed in terms of an application requiring a linear array of closely-spaced cantilever mirrors.

AB - This paper discusses a significant improvement of the SOI process that can be implemented in various manners and that remedies many problems of earlier fabrication schemes. In particular the new MOEMS structures are monolithic, do not exhibit rotational snapdown, have electrical shielding between channels, and have activation voltages less than or comparable to parallel plate devices. The approach is discussed in terms of an application requiring a linear array of closely-spaced cantilever mirrors.

KW - Dielectric substrates

KW - Electrodes

KW - Electrostatics

KW - Etching

KW - Micromechanical devices

KW - Mirrors

KW - Research and development

KW - Silicon

KW - Springs

KW - Voltage

UR - http://www.scopus.com/inward/record.url?scp=84946214893&partnerID=8YFLogxK

UR - http://www.scopus.com/inward/citedby.url?scp=84946214893&partnerID=8YFLogxK

U2 - 10.1109/OMEMS.2003.1233482

DO - 10.1109/OMEMS.2003.1233482

M3 - Conference contribution

AN - SCOPUS:84946214893

T3 - 2003 IEEE/LEOS International Conference on Optical MEMS

SP - 91

EP - 92

BT - 2003 IEEE/LEOS International Conference on Optical MEMS

PB - Institute of Electrical and Electronics Engineers Inc.

T2 - 2003 IEEE/LEOS International Conference on Optical MEMS

Y2 - 18 August 2003 through 21 August 2003

ER -