Gas-assisted electron-beam-induced nanopatterning of high-quality titanium oxide

A. V. Riazanova; B. N. Costanzi; A. I. Aristov; Y. G.M. Rikers; J. J.L. Mulders; A. V. Kabashin; E. Dan Dahlberg; L. M. Belova

doi:10.1088/0957-4484/27/11/115304

Gas-assisted electron-beam-induced nanopatterning of high-quality titanium oxide

A. V. Riazanova, B. N. Costanzi, A. I. Aristov, Y. G.M. Rikers, J. J.L. Mulders, A. V. Kabashin, E. Dan Dahlberg, L. M. Belova

Physics and Astronomy (Twin Cities)

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

Electron-beam-induced deposition of titanium oxide nanopatterns is described. The precursor is titanium tetra-isopropoxide, delivered to the deposition point through a needle and mixed with oxygen at the same point via a flow through a separate needle. The depositions are free of residual carbon and have an EDX determined stoichiometry of TiO_2.2. High resolution transmission electron microscopy and Raman spectroscopy studies reveal an amorphous structure of the fabricated titanium oxide. Ellipsometric characterization of the deposited material reveals a refractive index of 2.2-2.4 RIU in the spectral range of 500-1700 nm and a very low extinction coefficient (lower than 10^-6 in the range of 400-1700 nm), which is consistent with high quality titanium oxide. The electrical resistivity of the titanium oxide patterned with this new process is in the range of 10-40 GΩ cm and the measured breakdown field is in the range of 10-70 V μm^-1. The fabricated nanopatterns are important for a variety of applications, including field-effect transistors, memory devices, MEMS, waveguide structures, bio- and chemical sensors.

Original language	English (US)
Article number	115304
Journal	Nanotechnology
Volume	27
Issue number	11
DOIs	https://doi.org/10.1088/0957-4484/27/11/115304
State	Published - Feb 16 2016

Bibliographical note

Funding Information:
AVR and LMB gratefully acknowledge the financial support from the Swedish Research Council and Carl Tryggers Foundation. AVK and AIA acknowledge the support of the A*MIDEX project (n° ANR-11-IDEX-0001-02) funded by the ‘Investissements d’Avenir’ French Government program, managed by the French National Research Agency (ANR) and by LASERNANOCANCER project of the INCA INSERM (INCa-DGOS-Inserm 6038). BNC and EDD acknowledge support from ONR Grant N00014-11-1-0850 and the MRSEC Program of the NSF under Grant No. DMR- 0819885. BNC and EDD also acknowledge additional support for work done using the University of Minnesota Nanofabrication Center and Characterization Facility provided by the NSF NNIN network. BNC acknowledges support of a University of Minnesota Thesis Research Travel Grant. The authors are also grateful to Piet Trompenaars (FEI Electron Optics, The Netherlands) for his dedicated help in the design of thin needles used for EBID process, and to Valter Ström (MSE Department, KTH, Sweden) for the design of the circuit for the electrical measurements. This work was conducted within the framework of the COST Action CM1301 (CELINA).

Publisher Copyright:
© 2016 IOP Publishing Ltd.

Keywords

3D nanopatterning
gas-assisted EBID
high-purity insulator
purification
titanium tetraisopropoxide (TTIP)

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title = "Gas-assisted electron-beam-induced nanopatterning of high-quality titanium oxide",

abstract = "Electron-beam-induced deposition of titanium oxide nanopatterns is described. The precursor is titanium tetra-isopropoxide, delivered to the deposition point through a needle and mixed with oxygen at the same point via a flow through a separate needle. The depositions are free of residual carbon and have an EDX determined stoichiometry of TiO2.2. High resolution transmission electron microscopy and Raman spectroscopy studies reveal an amorphous structure of the fabricated titanium oxide. Ellipsometric characterization of the deposited material reveals a refractive index of 2.2-2.4 RIU in the spectral range of 500-1700 nm and a very low extinction coefficient (lower than 10-6 in the range of 400-1700 nm), which is consistent with high quality titanium oxide. The electrical resistivity of the titanium oxide patterned with this new process is in the range of 10-40 GΩ cm and the measured breakdown field is in the range of 10-70 V μm-1. The fabricated nanopatterns are important for a variety of applications, including field-effect transistors, memory devices, MEMS, waveguide structures, bio- and chemical sensors.",

keywords = "3D nanopatterning, gas-assisted EBID, high-purity insulator, purification, titanium tetraisopropoxide (TTIP)",

author = "Riazanova, {A. V.} and Costanzi, {B. N.} and Aristov, {A. I.} and Rikers, {Y. G.M.} and Mulders, {J. J.L.} and Kabashin, {A. V.} and Dahlberg, {E. Dan} and Belova, {L. M.}",

note = "Funding Information: AVR and LMB gratefully acknowledge the financial support from the Swedish Research Council and Carl Tryggers Foundation. AVK and AIA acknowledge the support of the A*MIDEX project (n° ANR-11-IDEX-0001-02) funded by the {\textquoteleft}Investissements d{\textquoteright}Avenir{\textquoteright} French Government program, managed by the French National Research Agency (ANR) and by LASERNANOCANCER project of the INCA INSERM (INCa-DGOS-Inserm 6038). BNC and EDD acknowledge support from ONR Grant N00014-11-1-0850 and the MRSEC Program of the NSF under Grant No. DMR- 0819885. BNC and EDD also acknowledge additional support for work done using the University of Minnesota Nanofabrication Center and Characterization Facility provided by the NSF NNIN network. BNC acknowledges support of a University of Minnesota Thesis Research Travel Grant. The authors are also grateful to Piet Trompenaars (FEI Electron Optics, The Netherlands) for his dedicated help in the design of thin needles used for EBID process, and to Valter Str{\"o}m (MSE Department, KTH, Sweden) for the design of the circuit for the electrical measurements. This work was conducted within the framework of the COST Action CM1301 (CELINA). Publisher Copyright: {\textcopyright} 2016 IOP Publishing Ltd.",

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AU - Riazanova, A. V.

AU - Costanzi, B. N.

AU - Aristov, A. I.

AU - Rikers, Y. G.M.

AU - Mulders, J. J.L.

AU - Kabashin, A. V.

AU - Dahlberg, E. Dan

AU - Belova, L. M.

N1 - Funding Information: AVR and LMB gratefully acknowledge the financial support from the Swedish Research Council and Carl Tryggers Foundation. AVK and AIA acknowledge the support of the A*MIDEX project (n° ANR-11-IDEX-0001-02) funded by the ‘Investissements d’Avenir’ French Government program, managed by the French National Research Agency (ANR) and by LASERNANOCANCER project of the INCA INSERM (INCa-DGOS-Inserm 6038). BNC and EDD acknowledge support from ONR Grant N00014-11-1-0850 and the MRSEC Program of the NSF under Grant No. DMR- 0819885. BNC and EDD also acknowledge additional support for work done using the University of Minnesota Nanofabrication Center and Characterization Facility provided by the NSF NNIN network. BNC acknowledges support of a University of Minnesota Thesis Research Travel Grant. The authors are also grateful to Piet Trompenaars (FEI Electron Optics, The Netherlands) for his dedicated help in the design of thin needles used for EBID process, and to Valter Ström (MSE Department, KTH, Sweden) for the design of the circuit for the electrical measurements. This work was conducted within the framework of the COST Action CM1301 (CELINA). Publisher Copyright: © 2016 IOP Publishing Ltd.

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N2 - Electron-beam-induced deposition of titanium oxide nanopatterns is described. The precursor is titanium tetra-isopropoxide, delivered to the deposition point through a needle and mixed with oxygen at the same point via a flow through a separate needle. The depositions are free of residual carbon and have an EDX determined stoichiometry of TiO2.2. High resolution transmission electron microscopy and Raman spectroscopy studies reveal an amorphous structure of the fabricated titanium oxide. Ellipsometric characterization of the deposited material reveals a refractive index of 2.2-2.4 RIU in the spectral range of 500-1700 nm and a very low extinction coefficient (lower than 10-6 in the range of 400-1700 nm), which is consistent with high quality titanium oxide. The electrical resistivity of the titanium oxide patterned with this new process is in the range of 10-40 GΩ cm and the measured breakdown field is in the range of 10-70 V μm-1. The fabricated nanopatterns are important for a variety of applications, including field-effect transistors, memory devices, MEMS, waveguide structures, bio- and chemical sensors.

AB - Electron-beam-induced deposition of titanium oxide nanopatterns is described. The precursor is titanium tetra-isopropoxide, delivered to the deposition point through a needle and mixed with oxygen at the same point via a flow through a separate needle. The depositions are free of residual carbon and have an EDX determined stoichiometry of TiO2.2. High resolution transmission electron microscopy and Raman spectroscopy studies reveal an amorphous structure of the fabricated titanium oxide. Ellipsometric characterization of the deposited material reveals a refractive index of 2.2-2.4 RIU in the spectral range of 500-1700 nm and a very low extinction coefficient (lower than 10-6 in the range of 400-1700 nm), which is consistent with high quality titanium oxide. The electrical resistivity of the titanium oxide patterned with this new process is in the range of 10-40 GΩ cm and the measured breakdown field is in the range of 10-70 V μm-1. The fabricated nanopatterns are important for a variety of applications, including field-effect transistors, memory devices, MEMS, waveguide structures, bio- and chemical sensors.

KW - 3D nanopatterning

KW - gas-assisted EBID

KW - high-purity insulator

KW - purification

KW - titanium tetraisopropoxide (TTIP)

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Gas-assisted electron-beam-induced nanopatterning of high-quality titanium oxide

Abstract

Bibliographical note

Keywords

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