TY - GEN
T1 - Gas phase nanoparticle integration
AU - Barry, Chad R.
AU - Kortshagen, Uwe
AU - Jacobs, Heiko O.
PY - 2007
Y1 - 2007
N2 - We report on two gas phase nanoparticle integration processes to assemble nanomaterials onto desired areas on a substrate. We expect these processes to work with any material that can be charged. The processes offer self-aligned integration and could be applied to any nanomaterial device requiring site specific assembly. The Coulomb force process directs the assembly of nanoparticles onto charged surface areas with sub-100 nm resolution. The charging is accomplished using flexible nanostructured electrodes. Gas phase assembly systems are used to direct and monitor the assembly of nanoparticles onto the charge patterns with a lateral resolution of 50 nm. The second concept makes use of fringing fields. The fringing fields directed the assembly of nanoparticles into openings. The fringing fields can be confined to sub 50 nm sized areas and exceed 1 MV/m, acting as nanolenses. Gas phase assembly systems have been used to deposit silicon, germanium, metallic, and organic nanoparticles.
AB - We report on two gas phase nanoparticle integration processes to assemble nanomaterials onto desired areas on a substrate. We expect these processes to work with any material that can be charged. The processes offer self-aligned integration and could be applied to any nanomaterial device requiring site specific assembly. The Coulomb force process directs the assembly of nanoparticles onto charged surface areas with sub-100 nm resolution. The charging is accomplished using flexible nanostructured electrodes. Gas phase assembly systems are used to direct and monitor the assembly of nanoparticles onto the charge patterns with a lateral resolution of 50 nm. The second concept makes use of fringing fields. The fringing fields directed the assembly of nanoparticles into openings. The fringing fields can be confined to sub 50 nm sized areas and exceed 1 MV/m, acting as nanolenses. Gas phase assembly systems have been used to deposit silicon, germanium, metallic, and organic nanoparticles.
UR - http://www.scopus.com/inward/record.url?scp=70349895793&partnerID=8YFLogxK
UR - http://www.scopus.com/inward/citedby.url?scp=70349895793&partnerID=8YFLogxK
U2 - 10.1557/proc-1002-n07-13
DO - 10.1557/proc-1002-n07-13
M3 - Conference contribution
AN - SCOPUS:70349895793
SN - 9781605604367
T3 - Materials Research Society Symposium Proceedings
SP - 66
EP - 71
BT - Materials Research Society Symposium Proceedings - Printing Methods for Electronic, Photonics and Biomaterials
PB - Materials Research Society
T2 - Printing Methods for Electronic, Photonics and Biomaterials - 2007 MRS Spring Meeting
Y2 - 9 April 2007 through 13 April 2009
ER -