Abstract
A new, analytical model for heterostructure field effect transistors is presented. The model is in the framework of the gradual channel approximation and includes the effects of gate leakage, velocity saturation, and subthreshold conduction. The consideration of gate leakage makes this model particularly useful for application to enhancement-mode devices.
Original language | English (US) |
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Pages (from-to) | 2267-2270 |
Number of pages | 4 |
Journal | IEEE Transactions on Electron Devices |
Volume | 37 |
Issue number | 10 |
DOIs | |
State | Published - Oct 1990 |
Externally published | Yes |