In-situ and Ex-situ TEM Characterization of Domain Wall-Defect Interactions Using Applied DC Bias in Bismuth Ferrite Thin Films

M. L. Jablonski; C. R. Winkler; Anoop R Damodaran; J. Karthik; J. G. Wen; D. J. Miller; L. W. Martin; M. L. Taheri

doi:10.1017/S1431927612009166

In-situ and Ex-situ TEM Characterization of Domain Wall-Defect Interactions Using Applied DC Bias in Bismuth Ferrite Thin Films

M. L. Jablonski, C. R. Winkler, Anoop R Damodaran, J. Karthik, J. G. Wen, D. J. Miller, L. W. Martin, M. L. Taheri

Research output: Contribution to journal › Article › peer-review

Original language	English (US)
Pages (from-to)	1462-1463
Number of pages	2
Journal	Microscopy and Microanalysis
Volume	18
Issue number	S2
DOIs	https://doi.org/10.1017/S1431927612009166
State	Published - Jul 2012
Externally published	Yes

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10.1017/S1431927612009166

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In-situ and Ex-situ TEM Characterization of Domain Wall-Defect Interactions Using Applied DC Bias in Bismuth Ferrite Thin Films. / Jablonski, M. L.; Winkler, C. R.; Damodaran, Anoop R; Karthik, J.; Wen, J. G.; Miller, D. J.; Martin, L. W.; Taheri, M. L.

In: Microscopy and Microanalysis, Vol. 18, No. S2, 07.2012, p. 1462-1463.

Research output: Contribution to journal › Article › peer-review

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