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Laterally-scaled Si/SiGe n-MODFETs with in situ and ion-implanted p-well doping
S. J. Koester, K. L. Saenger, J. O. Chu, Q. C. Ouyang, J. A. Ott, D. F. Canaperi, J. A. Tornello, C. V. Jahnes, S. E. Steen
Research output: Chapter in Book/Report/Conference proceeding › Conference contribution
4
Scopus
citations