Lithographic approach to pattern multiple nanoparticle thin films prepared by layer-by-layer self-assembly for microsystems

Tianhong Cui; Feng Hua; Yuri Lvov

doi:10.1016/j.sna.2004.01.023

Lithographic approach to pattern multiple nanoparticle thin films prepared by layer-by-layer self-assembly for microsystems

Tianhong Cui, Feng Hua, Yuri Lvov

Mechanical Engineering

Research output: Contribution to journal › Conference article › peer-review

29 Scopus citations

Abstract

We report a lithographic approach to pattern multiple types of layer-by-layer (LbL) self-assembled nanoparticle thin films. Polystyrene particles (150 and 64nm) are spatially separated in desired patterns with a feature size of 5-20μm. The process is technically simple, consisting of only two consecutive lift-off steps, and can be applied to various types of nanoparticles. This method can be applied to various types of nanoparticles. Since it is based on the conventional lithographic technique, it provides a simple, reliable, and cheap method to pattern nanoparticles into two-dimensional patterns of microscale pitches for the fabrication of complex microsystems which is composed mainly of functional nanoparticles for the applications to sensing and actuation.

Original language	English (US)
Pages (from-to)	501-504
Number of pages	4
Journal	Sensors and Actuators, A: Physical
Volume	114
Issue number	2-3
DOIs	https://doi.org/10.1016/j.sna.2004.01.023
State	Published - Sep 1 2004
Event	Selected Papers from Transducers 03 - Boston, MA, United States Duration: Jun 8 2003 → Jun 12 2003

Bibliographical note

Funding Information:
This work is partially supported by NSF/LEQSF(2001-04)-RII-02 foundation and Louisiana BOR 2002-RDA19 grants. Any opinions, finding, and conclusions or recommendations expressed in this material are those of the authors and do not necessarily reflect the view of the National Science Foundation. We also acknowledge Dr. Naidu Seetala at Grambling State University for the assist with the scanning electronic microscopy pictures.

Keywords

Lithograpgy
Microsystems
Nano self-assembly
Nanoparticle
Patterning

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title = "Lithographic approach to pattern multiple nanoparticle thin films prepared by layer-by-layer self-assembly for microsystems",

abstract = "We report a lithographic approach to pattern multiple types of layer-by-layer (LbL) self-assembled nanoparticle thin films. Polystyrene particles (150 and 64nm) are spatially separated in desired patterns with a feature size of 5-20μm. The process is technically simple, consisting of only two consecutive lift-off steps, and can be applied to various types of nanoparticles. This method can be applied to various types of nanoparticles. Since it is based on the conventional lithographic technique, it provides a simple, reliable, and cheap method to pattern nanoparticles into two-dimensional patterns of microscale pitches for the fabrication of complex microsystems which is composed mainly of functional nanoparticles for the applications to sensing and actuation.",

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author = "Tianhong Cui and Feng Hua and Yuri Lvov",

note = "Funding Information: This work is partially supported by NSF/LEQSF(2001-04)-RII-02 foundation and Louisiana BOR 2002-RDA19 grants. Any opinions, finding, and conclusions or recommendations expressed in this material are those of the authors and do not necessarily reflect the view of the National Science Foundation. We also acknowledge Dr. Naidu Seetala at Grambling State University for the assist with the scanning electronic microscopy pictures. ; Selected Papers from Transducers 03 ; Conference date: 08-06-2003 Through 12-06-2003",

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AU - Cui, Tianhong

AU - Hua, Feng

AU - Lvov, Yuri

N1 - Funding Information: This work is partially supported by NSF/LEQSF(2001-04)-RII-02 foundation and Louisiana BOR 2002-RDA19 grants. Any opinions, finding, and conclusions or recommendations expressed in this material are those of the authors and do not necessarily reflect the view of the National Science Foundation. We also acknowledge Dr. Naidu Seetala at Grambling State University for the assist with the scanning electronic microscopy pictures.

PY - 2004/9/1

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N2 - We report a lithographic approach to pattern multiple types of layer-by-layer (LbL) self-assembled nanoparticle thin films. Polystyrene particles (150 and 64nm) are spatially separated in desired patterns with a feature size of 5-20μm. The process is technically simple, consisting of only two consecutive lift-off steps, and can be applied to various types of nanoparticles. This method can be applied to various types of nanoparticles. Since it is based on the conventional lithographic technique, it provides a simple, reliable, and cheap method to pattern nanoparticles into two-dimensional patterns of microscale pitches for the fabrication of complex microsystems which is composed mainly of functional nanoparticles for the applications to sensing and actuation.

AB - We report a lithographic approach to pattern multiple types of layer-by-layer (LbL) self-assembled nanoparticle thin films. Polystyrene particles (150 and 64nm) are spatially separated in desired patterns with a feature size of 5-20μm. The process is technically simple, consisting of only two consecutive lift-off steps, and can be applied to various types of nanoparticles. This method can be applied to various types of nanoparticles. Since it is based on the conventional lithographic technique, it provides a simple, reliable, and cheap method to pattern nanoparticles into two-dimensional patterns of microscale pitches for the fabrication of complex microsystems which is composed mainly of functional nanoparticles for the applications to sensing and actuation.

KW - Lithograpgy

KW - Microsystems

KW - Nano self-assembly

KW - Nanoparticle

KW - Patterning

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ER -

Lithographic approach to pattern multiple nanoparticle thin films prepared by layer-by-layer self-assembly for microsystems

Abstract

Bibliographical note

Keywords

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