Lithographic approach to pattern self-assembled nanoparticle multilayers

Feng Hua, Tianhong Cui, Yuri Lvov

Research output: Contribution to journalArticlepeer-review

71 Scopus citations

Abstract

A study of lithographic approach to pattern self-assembled nanoparticle multilayers was carried out using silicon-based lithographical technology. The advantages of the method include a simpler process with micron feature size and very good reproducibility and also can be applied to almost all charged nanoscale building blocks. The results showed that this method provides a technology for nanodevices such as nanoelectronic chips or NEMS, which have a variety of potential applications.

Original languageEnglish (US)
Pages (from-to)6712-6715
Number of pages4
JournalLangmuir
Volume18
Issue number17
DOIs
StatePublished - Aug 20 2002

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