Low temperature ripple formation: ion-induced effective surface diffusion in ion sputtering

M. A. Makeev, A. L. Barabäsi

Research output: Contribution to journalConference articlepeer-review

Abstract

Surfaces bombarded with energetic ions may develop a rough or a ripple surface morphology. The ripple formation has been successfully described by the instability caused by preferential erosion, the ripple wavelength being determined by the competition between surface erosion and thermally activated diffusion. However, as recent experiments and computer simulations have shown, ripple formation takes place even at the low temperatures, when thermally activated processes are suppressed. In this paper we propose a theory to explain low-temperature ripple formation based on the ion-induced effective surface diffusion.

Original languageEnglish (US)
Pages (from-to)249-254
Number of pages6
JournalMaterials Research Society Symposium - Proceedings
Volume540
StatePublished - Jan 1 1999
EventProceedings of the 1998 MRS Fall Meeting - The Symposium 'Advanced Catalytic Materials-1998' - Boston, MA, USA
Duration: Nov 30 1998Dec 3 1998

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