@inproceedings{27292fc5fbe2480891a4d74a1cf28d04,
title = "Mass spectrometric analysis of a high pressure, inductively coupled plasma during diamond film growth",
abstract = "Determination of the gas phase composition at or near a substrate surface during plasma assisted chemical vapor deposition presents a challenging problem. The species located at a growing surface include highly reactive radicals which are difficult to detect in atmospheric plasma conditions. A system has been designed which consists of an inductively coupled rf plasma reactor linked to a quadrupole mass spectrometer (QMS) via a supersonic convergent-divergent nozzle. Differential pumping in the transient stages allows the plasma chamber to be operated at or near atmospheric pressures, while facilitating the detection of reactant species present in the growth boundary layer with the QMS.",
author = "Greuel, {Peter G.} and Yoon, {Hyun J.} and Ernie, {Douglas W.} and Roberts, {Jeffrey T.}",
year = "1994",
month = jan,
day = "1",
language = "English (US)",
isbn = "1558992332",
series = "Materials Research Society Symposium Proceedings",
publisher = "Publ by Materials Research Society",
pages = "141--146",
booktitle = "Gas-Phase and Surface Chemistry in Electronic Materials Processing",
note = "Proceedings of the 1993 Fall Meeting of the Materials Research Society ; Conference date: 29-11-1993 Through 02-12-1993",
}