Microstructure comparison between co-sputtered and multilayer-sputtered FePt:Ag granular thin films

Xiaomin Cheng, Zuoyi Li, Jianping Wang

Research output: Contribution to journalArticlepeer-review

2 Scopus citations

Abstract

Two different sputtering modes, co-sputtering and multilayer-sputtering, were used to fabricate FePt:Ag granular thin films. It is observed by the MFM and TEM images that smaller magnetic domain patterns and grains are more uniformly distributed in the co-sputtered granular films compared to in multilayer-sputtered ones. This difference in the microstructure is explained to be attributed to the more randomly distributed Ag atoms in the co-sputtered films. Further study on in-depth defects in these films confirms this explanation.

Original languageEnglish (US)
Pages (from-to)1879-1881
Number of pages3
JournalXiyou Jinshu Cailiao Yu Gongcheng/Rare Metal Materials and Engineering
Volume34
Issue number12
StatePublished - Dec 1 2005

Keywords

  • Co-sputtering
  • FePt:Ag granular films
  • Microstructure
  • Multilayer-sputtering

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