Modeling particle formation during low-pressure silane oxidation: Detailed chemical kinetics and aerosol dynamics

S. M. Suh, M. R. Zachariah, S. L. Girshick

Research output: Contribution to journalArticlepeer-review

28 Scopus citations

Abstract

The chemical modelling of silcon dioxide clustering coupled to an aerosol dynamics model, enablied time-dependent zero-dimensional simulations. A detailed analysis of the gas phase nucleation of hydrogenated silicon particles was made based on a chemical clustering approach. The Quantum Rice-Ramsperger-Kassel (QRRK) theory was applied to obtain the pressure dependence of rate parameters. Four clustering pathways were considered. SiO and SiO2 were found to play an important role in particle surface growth. The initial surface-reaction controlled process was followed by a coagulation phase which lead to rapid increase in particle size. The effects of temperature and pressure on nucleation were studied.

Original languageEnglish (US)
Pages (from-to)940-951
Number of pages12
JournalJournal of Vacuum Science and Technology, Part A: Vacuum, Surfaces and Films
Volume19
Issue number3
DOIs
StatePublished - May 2001

Fingerprint

Dive into the research topics of 'Modeling particle formation during low-pressure silane oxidation: Detailed chemical kinetics and aerosol dynamics'. Together they form a unique fingerprint.

Cite this