Molecular dynamic simulation study of plasma etching L1₀ FePt media in embedded mask patterning (EMP) process

Physics & Astronomy

• plasma etching 100%
• masks 75%
• molecular dynamics 63%
• ions 41%
• simulation 33%
• defects 30%
• surface layers 28%
• interstitials 28%
• sputtering 17%
• etching 16%
• ion impact 14%
• etchants 13%
• embedded atom method 13%
• stopping 11%
• atoms 11%
• point defects 10%
• energy 9%
• energy levels 8%
• magnetic properties 7%
• single crystals 6%
• gases 5%
• metals 5%
• interactions 4%