Monolithic pixel sensors in deep-submicron SOI technology with analog and digital pixels

Marco Battaglia; Dario Bisello; Devis Contarato; Peter Denes; Piero Giubilato; Lindsay Glesener; Serena Mattiazzo; Chinh Vu

doi:10.1016/j.nima.2009.01.178

Monolithic pixel sensors in deep-submicron SOI technology with analog and digital pixels

Marco Battaglia, Dario Bisello, Devis Contarato, Peter Denes, Piero Giubilato, Lindsay Glesener, Serena Mattiazzo, Chinh Vu

Physics and Astronomy (Twin Cities)

Research output: Contribution to journal › Article › peer-review

14 Scopus citations

Abstract

This paper presents the design and test results of a prototype monolithic pixel sensor manufactured in deep-submicron fully depleted Silicon-On-Insulator (SOI) CMOS technology. In the SOI technology, a thin layer of integrated electronics is insulated from a (high-resistivity) silicon substrate by a buried oxide. Vias etched through the oxide allow to contact the substrate from the electronics layer, so that pixel implants can be created and a reverse bias can be applied. The prototype chip, manufactured in OKI 0.15 μ m SOI process, features both analog and digital pixels on a 10 μ m pitch. Results of tests performed with an infrared laser and 1.35 GeV electrons and a first assessment of the effect of ionising and non-ionising doses are discussed.

Original language	English (US)
Pages (from-to)	380-384
Number of pages	5
Journal	Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment
Volume	604
Issue number	1-2
DOIs	https://doi.org/10.1016/j.nima.2009.01.178
State	Published - Jun 1 2009

Bibliographical note

Funding Information:
This work was supported by the Director, Office of Science, of the US Department of Energy under Contract no. DE-AC02-05CH11231. We thank the staff of the LBNL Advanced Light Source and 88-in. Cyclotron for their assistance and for the excellent performance of the machines.

Keywords

CMOS technology
Monolithic pixel sensor
Particle detection
SOI

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Battaglia, M., Bisello, D., Contarato, D., Denes, P., Giubilato, P., Glesener, L., Mattiazzo, S., & Vu, C. (2009). Monolithic pixel sensors in deep-submicron SOI technology with analog and digital pixels. Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, 604(1-2), 380-384. https://doi.org/10.1016/j.nima.2009.01.178

Monolithic pixel sensors in deep-submicron SOI technology with analog and digital pixels. / Battaglia, Marco; Bisello, Dario; Contarato, Devis et al.
In: Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, Vol. 604, No. 1-2, 01.06.2009, p. 380-384.

Research output: Contribution to journal › Article › peer-review

Battaglia, M, Bisello, D, Contarato, D, Denes, P, Giubilato, P, Glesener, L, Mattiazzo, S & Vu, C 2009, 'Monolithic pixel sensors in deep-submicron SOI technology with analog and digital pixels', Nuclear Instruments and Methods in Physics Research, Section A: Accelerators, Spectrometers, Detectors and Associated Equipment, vol. 604, no. 1-2, pp. 380-384. https://doi.org/10.1016/j.nima.2009.01.178

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Monolithic pixel sensors in deep-submicron SOI technology with analog and digital pixels

Abstract

Bibliographical note

Keywords

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