Nanopore and nanobushing arrays from ABC triblock thin films containing two etchable blocks

The formation of the targeted nanostructure arrays from ABC triblocks containing polystyrene (PS) and two chemically etchable blocks, polyisoprene (PS) and polylactide (PLA) was investigated. A PS-PI-PLA triblock copolymer was prepared by sequential anionic polymerization, end capping with ethylene oxide and subsequent aluminum catalyzed polymerization of lactide. An AFM height image suggested the formation of nanoscopic PS pillars and a small hole was observed in the centers of nearly all of the posts. These nanoporous thin films should be effective templates for the generation of metal anti-ring arrays upon deposition.