Nanostructured silicon formations as a result of ionized N2 gas reactions on silicon with native oxide layers

Min Cherl Jung, Tae Gyoung Lee, Young Ju Park, Sung Ho Jun, Joosang Lee, Moonsup Man, Jong Seok Jeong, Jeong Yong Lee

Research output: Contribution to journalArticlepeer-review

6 Scopus citations

Abstract

The formation of nanostructured silicon, by the reaction between ionized nitrogen and silicon was discussed. The nanocrystalline silicon formation and nanostructured surface modification method, using the ionized gases were found to be simple and efficient methods. The optical properties, surface morphology and electronic structure of the nanostructured silicon were also discussed.

Original languageEnglish (US)
Pages (from-to)3653-3655
Number of pages3
JournalApplied Physics Letters
Volume82
Issue number21
DOIs
StatePublished - May 26 2003

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