Abstract
The formation of nanostructured silicon, by the reaction between ionized nitrogen and silicon was discussed. The nanocrystalline silicon formation and nanostructured surface modification method, using the ionized gases were found to be simple and efficient methods. The optical properties, surface morphology and electronic structure of the nanostructured silicon were also discussed.
Original language | English (US) |
---|---|
Pages (from-to) | 3653-3655 |
Number of pages | 3 |
Journal | Applied Physics Letters |
Volume | 82 |
Issue number | 21 |
DOIs | |
State | Published - May 26 2003 |