Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges

Eray S. Aydil; Denise C. Marra

doi:10.1109/IMNC.1998.729911

Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges

Materials Research Science & Engineering Center

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Original language	English (US)
Title of host publication	Digest of Papers - Microprocesses and Nanotechnology 1998
Subtitle of host publication	1998 International Microprocesses and Nanotechnology Conference
Editors	Hyung Joon Yoo, Shinji Okazaki, Jinho Ahn, Ohyun Kim, Masanori Komuro
Publisher	Institute of Electrical and Electronics Engineers Inc.
Pages	6-7
Number of pages	2
ISBN (Electronic)	4930813832, 9784930813831
DOIs	https://doi.org/10.1109/IMNC.1998.729911
State	Published - 1998
Event	1998 International Microprocesses and Nanotechnology Conference, MNC 1998 - Kyoungju, Korea, Republic of Duration: Jul 13 1998 → Jul 16 1998

Publication series

Name	Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference
Volume	1998-July

Other

Other	1998 International Microprocesses and Nanotechnology Conference, MNC 1998
Country/Territory	Korea, Republic of
City	Kyoungju
Period	7/13/98 → 7/16/98

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Aydil, E. S., & Marra, D. C. (1998). Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges. In H. J. Yoo, S. Okazaki, J. Ahn, O. Kim, & M. Komuro (Eds.), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference (pp. 6-7). Article 729911 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July). Institute of Electrical and Electronics Engineers Inc.. https://doi.org/10.1109/IMNC.1998.729911

Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges. / Aydil, Eray S.; Marra, Denise C.
Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. ed. / Hyung Joon Yoo; Shinji Okazaki; Jinho Ahn; Ohyun Kim; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. p. 6-7 729911 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference; Vol. 1998-July).

Research output: Chapter in Book/Report/Conference proceeding › Conference contribution

Aydil, ES & Marra, DC 1998, Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges. in HJ Yoo, S Okazaki, J Ahn, O Kim & M Komuro (eds), Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference., 729911, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference, vol. 1998-July, Institute of Electrical and Electronics Engineers Inc., pp. 6-7, 1998 International Microprocesses and Nanotechnology Conference, MNC 1998, Kyoungju, Korea, Republic of, 7/13/98. https://doi.org/10.1109/IMNC.1998.729911

Aydil ES, Marra DC. Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges. In Yoo HJ, Okazaki S, Ahn J, Kim O, Komuro M, editors, Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. Institute of Electrical and Electronics Engineers Inc. 1998. p. 6-7. 729911. (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference). doi: 10.1109/IMNC.1998.729911

Aydil, Eray S. ; Marra, Denise C. / Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges. Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference. editor / Hyung Joon Yoo ; Shinji Okazaki ; Jinho Ahn ; Ohyun Kim ; Masanori Komuro. Institute of Electrical and Electronics Engineers Inc., 1998. pp. 6-7 (Digest of Papers - Microprocesses and Nanotechnology 1998: 1998 International Microprocesses and Nanotechnology Conference).

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Nature of the silicon and silicon dioxide surfaces during plasma etching with fluorocarbon containing discharges

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