Engineering & Materials Science
Plasma enhanced chemical vapor deposition
100%
Molybdenum
82%
Plasmas
43%
Hydrogen evolution reaction
21%
Film growth
18%
Inductively coupled plasma
17%
Vacancies
15%
Stoichiometry
15%
Chemical vapor deposition
13%
Argon
13%
Lithium-ion batteries
12%
Nucleation
12%
Nanoparticles
11%
Sulfur
11%
Catalysts
9%
Hydrogen
9%
Flow rate
8%
Defects
8%
Temperature
4%
Chemical Compounds
Molybdenum Disulfide
84%
Plasma Enhanced Chemical Vapour Deposition
84%
Liquid Film
34%
Plasma
24%
Molybdenum Pentachloride
18%
Vapor Deposition Process
12%
Elemental Sulfur
11%
Nonstoichiometric Compound
11%
Hydrogen
10%
Inductively Coupled Plasma
10%
Nucleation
8%
Reaction Stoichiometry
8%
Flow Kinetics
7%
Catalyst
4%
Time
3%
Application
3%