Nonthermal Plasma-Enhanced Chemical Vapor Deposition of Two-Dimensional Molybdenum Disulfide

Engineering & Materials Science

• Plasma enhanced chemical vapor deposition 100%
• Molybdenum 82%
• Plasmas 43%
• Hydrogen evolution reaction 21%
• Film growth 18%
• Inductively coupled plasma 17%
• Vacancies 15%
• Stoichiometry 15%
• Chemical vapor deposition 13%
• Argon 13%
• Lithium-ion batteries 12%
• Nucleation 12%
• Nanoparticles 11%
• Sulfur 11%
• Catalysts 9%
• Hydrogen 9%
• Flow rate 8%
• Defects 8%
• Temperature 4%

Chemical Compounds

• Molybdenum Disulfide 84%
• Plasma Enhanced Chemical Vapour Deposition 84%
• Liquid Film 34%
• Plasma 24%
• Molybdenum Pentachloride 18%
• Vapor Deposition Process 12%
• Elemental Sulfur 11%
• Nonstoichiometric Compound 11%
• Hydrogen 10%
• Inductively Coupled Plasma 10%
• Nucleation 8%
• Reaction Stoichiometry 8%
• Flow Kinetics 7%
• Catalyst 4%
• Time 3%
• Application 3%