Numerical modeling of silicon oxide particle formation and transport in a one-dimensional low-pressure chemical vapor deposition reactor

Engineering & Materials Science

• Low pressure chemical vapor deposition 100%
• Silicon oxides 88%
• Silanes 78%
• Numerical models 49%
• Aerosols 49%
• Oxygen 33%
• Dynamic models 32%
• Surface reactions 29%
• Thermophoresis 28%
• Coagulation 27%
• Particle size analysis 23%
• Reaction kinetics 22%
• Spatial distribution 22%
• Nucleation 21%
• Distribution functions 21%
• Convection 20%
• Pyrolysis 19%
• Volume fraction 18%
• Temperature 8%
• Experiments 7%

Chemical Compounds

• Low Pressure Chemical Vapour Deposition 89%
• Silicon Oxide 75%
• Silane 58%
• Thermal Diffusion 40%
• Distribution Function 37%
• Silicon Dioxide 37%
• Surface Reaction 31%
• Coagulation 31%
• Particle Size Distribution 30%
• Nucleation 25%
• Pyrolysis 21%
• Simulation 19%
• Diffusion 18%
• Pressure 17%
• Volume 17%
• Dioxygen 14%
• Liquid Film 14%

Earth & Environmental Sciences

• silicon 55%
• low pressure 55%
• oxide 45%
• reactor 42%
• particle 30%
• modeling 25%
• stagnation flow 15%
• aerosol 14%
• oxygen 13%
• coagulation 9%
• pyrolysis 9%
• nucleation 8%
• convection 7%
• particle size 7%
• spatial distribution 7%
• kinetics 6%
• prediction 5%
• simulation 4%
• temperature 3%
• parameter 3%
• effect 2%