Numerical simulation of nanoparticle transport during plasma-enhanced chemical vapor deposition

Sarah J. Warthesen; Uwe Kortshagen; Steven L. Girshick

doi:10.1109/TPS.2005.845321

Numerical simulation of nanoparticle transport during plasma-enhanced chemical vapor deposition

Sarah J. Warthesen, Uwe Kortshagen, Steven L. Girshick

Mechanical Engineering

Research output: Contribution to journal › Article › peer-review

1 Scopus citations

Abstract

The transport of nanoparticles is simulated under conditions of plasma-enhanced chemical vapor deposition. A fluid model solves the spatial and periodic variation in plasma properties and a Monte Carlo method is applied to simulate momentum and charge transfer collisions between nanoparticles and surrounding plasma species. Electrostatic trapping and particle deposition are observed and simulation results reveal the motion of individual nanoparticles.

Original language	English (US)
Pages (from-to)	398-399
Number of pages	2
Journal	IEEE Transactions on Plasma Science
Volume	33
Issue number	2 I
DOIs	https://doi.org/10.1109/TPS.2005.845321
State	Published - Apr 1 2005

Keywords

Monte Carlo
Nanoparticle
Plasma-enhanced chemical vapor deposition
Thermophoresis

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KW - Thermophoresis

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