Numerical simulation of nanoparticle transport during plasma-enhanced chemical vapor deposition

Sarah J. Warthesen, Uwe Kortshagen, Steven L. Girshick

Research output: Contribution to journalArticlepeer-review

3 Scopus citations

Abstract

The transport of nanoparticles is simulated under conditions of plasma-enhanced chemical vapor deposition. A fluid model solves the spatial and periodic variation in plasma properties and a Monte Carlo method is applied to simulate momentum and charge transfer collisions between nanoparticles and surrounding plasma species. Electrostatic trapping and particle deposition are observed and simulation results reveal the motion of individual nanoparticles.

Original languageEnglish (US)
Pages (from-to)398-399
Number of pages2
JournalIEEE Transactions on Plasma Science
Volume33
Issue number2 I
DOIs
StatePublished - Apr 2005

Bibliographical note

Funding Information:
Manuscript received July 2, 2004; revised November 30, 2004. This work was supported in part by the National Science Foundation under IGERT Grant DGE-0114372, in part by the Department of Energy under Grant DE-FG02-00ER54583, and in part by the Minnesota Supercomputing Institute.

Keywords

  • Monte Carlo
  • Nanoparticle
  • Plasma-enhanced chemical vapor deposition
  • Thermophoresis

Fingerprint

Dive into the research topics of 'Numerical simulation of nanoparticle transport during plasma-enhanced chemical vapor deposition'. Together they form a unique fingerprint.

Cite this