Numerical simulation of nanoparticle transport during plasma-enhanced chemical vapor deposition

Sarah J. Warthesen, Uwe Kortshagen, Steven L. Girshick

Research output: Contribution to journalArticlepeer-review

1 Scopus citations

Abstract

The transport of nanoparticles is simulated under conditions of plasma-enhanced chemical vapor deposition. A fluid model solves the spatial and periodic variation in plasma properties and a Monte Carlo method is applied to simulate momentum and charge transfer collisions between nanoparticles and surrounding plasma species. Electrostatic trapping and particle deposition are observed and simulation results reveal the motion of individual nanoparticles.

Original languageEnglish (US)
Pages (from-to)398-399
Number of pages2
JournalIEEE Transactions on Plasma Science
Volume33
Issue number2 I
DOIs
StatePublished - Apr 1 2005

Keywords

  • Monte Carlo
  • Nanoparticle
  • Plasma-enhanced chemical vapor deposition
  • Thermophoresis

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