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Oligosaccharide/silicon-containing block copolymers with 5 nm features for lithographic applications
Julia D. Cushen, Issei Otsuka, Christopher M. Bates, Sami Halila, Sébastien Fort, Cyrille Rochas, Jeffrey A. Easley, Erica L. Rausch, Anthony Thio, Redouane Borsali, C. Grant Willson, Christopher J. Ellison
Research output: Contribution to journal › Article › peer-review
196
Scopus
citations