Ordering poly(trimethylsilyl styrene-block- D,L -lactide) block copolymers in thin films by solvent annealing using a mixture of domain-selective solvents

Julia D. Cushen, Lei Wan, Gunja Pandav, Indranil Mitra, Gila E. Stein, Venkat Ganesan, Ricardo Ruiz, C. Grant Willson, Christopher J. Ellison

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