TY - GEN
T1 - Ozone ALD of doped ZnO as a transparent metal
AU - Yuan, Hai
AU - Luo, Bing
AU - Gladfelter, Wayne L.
AU - Campbell, Stephen A.
PY - 2012
Y1 - 2012
N2 - The rapidly escalating cost of indium tin oxide has led to search for lower cost transparent conductor options such as heavily doped zinc oxide. Here we study the donors aluminum (AZO) and gallium (GZO), as well as phosphorus (PZO) which is n-type as-deposited, but converts to p-type with a suitable anneal. We present the results of atomic layer deposition (ALD) of AZO, GZO, and PZO with ozone as the oxidant. The metal-containing precursors were diethyl zinc, trimethyl aluminum, triethylgallium and trimethylphosphite. Homogeneous and layered structures are compared. Homogeneous films with about 2% aluminum or gallium were found to have the lowest resistivity (∼0.5 milliohm-cm). For PZO, the lowest resistivity was found to occur for films with 3.2%P when annealed at 750°C (0.46 ohm-cm).
AB - The rapidly escalating cost of indium tin oxide has led to search for lower cost transparent conductor options such as heavily doped zinc oxide. Here we study the donors aluminum (AZO) and gallium (GZO), as well as phosphorus (PZO) which is n-type as-deposited, but converts to p-type with a suitable anneal. We present the results of atomic layer deposition (ALD) of AZO, GZO, and PZO with ozone as the oxidant. The metal-containing precursors were diethyl zinc, trimethyl aluminum, triethylgallium and trimethylphosphite. Homogeneous and layered structures are compared. Homogeneous films with about 2% aluminum or gallium were found to have the lowest resistivity (∼0.5 milliohm-cm). For PZO, the lowest resistivity was found to occur for films with 3.2%P when annealed at 750°C (0.46 ohm-cm).
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U2 - 10.1149/1.3700904
DO - 10.1149/1.3700904
M3 - Conference contribution
AN - SCOPUS:84869003649
SN - 9781566779555
T3 - ECS Transactions
SP - 389
EP - 400
BT - Dielectrics for Nanosystems 5
PB - Electrochemical Society Inc.
T2 - 5th International Symposium on Dielectrics for Nanosystems: Materials Science, Processing, Reliability and Manufacturing - 221st ECS Meeting
Y2 - 6 May 2012 through 10 May 2012
ER -