Ozone ALD of doped ZnO as a transparent metal

Research output: Chapter in Book/Report/Conference proceedingConference contribution

4 Scopus citations

Abstract

The rapidly escalating cost of indium tin oxide has led to search for lower cost transparent conductor options such as heavily doped zinc oxide. Here we study the donors aluminum (AZO) and gallium (GZO), as well as phosphorus (PZO) which is n-type as-deposited, but converts to p-type with a suitable anneal. We present the results of atomic layer deposition (ALD) of AZO, GZO, and PZO with ozone as the oxidant. The metal-containing precursors were diethyl zinc, trimethyl aluminum, triethylgallium and trimethylphosphite. Homogeneous and layered structures are compared. Homogeneous films with about 2% aluminum or gallium were found to have the lowest resistivity (∼0.5 milliohm-cm). For PZO, the lowest resistivity was found to occur for films with 3.2%P when annealed at 750°C (0.46 ohm-cm).

Original languageEnglish (US)
Title of host publicationDielectrics for Nanosystems 5
Subtitle of host publicationMaterials Science, Processing, Reliability, and Manufacturing -and- Tutorials in Nanotechnology: More than Moore - Beyond CMOS Emerging Materials and Devices
PublisherElectrochemical Society Inc.
Pages389-400
Number of pages12
Edition3
ISBN (Electronic)9781607683131
ISBN (Print)9781566779555
DOIs
StatePublished - 2012
Event5th International Symposium on Dielectrics for Nanosystems: Materials Science, Processing, Reliability and Manufacturing - 221st ECS Meeting - Seattle, WA, United States
Duration: May 6 2012May 10 2012

Publication series

NameECS Transactions
Number3
Volume45
ISSN (Print)1938-5862
ISSN (Electronic)1938-6737

Other

Other5th International Symposium on Dielectrics for Nanosystems: Materials Science, Processing, Reliability and Manufacturing - 221st ECS Meeting
Country/TerritoryUnited States
CitySeattle, WA
Period5/6/125/10/12

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