The particle transport in parallel-plate chemical vapor deposition (CVD) reactors was discussed. Measurements showing particle transport in the reactor were presented and studied using a Eulerian continuum particle transport formulation. The results showed that particles formed in the parallel-plate region were confined in a thin sheath between the hot wafer and cold showerhead inlet.
|Original language||English (US)|
|Number of pages||9|
|Journal||Journal of Vacuum Science and Technology A: Vacuum, Surfaces and Films|
|State||Published - Sep 1 2000|
|Event||47th International Symposium: Vacuum, Thin Films, Surfaces/Interfaces, and Processing - Boston, USA|
Duration: Oct 2 2000 → Oct 6 2000