Perpendicular orientation of cylindrical domains upon solvent annealing thin films of polystyrene-b-polylactide

Marylène Vayer; Marc A. Hillmyer; Mohammed Dirany; Guillaume Thevenin; René Erre; Christophe Sinturel

doi:10.1016/j.tsf.2009.10.015

Perpendicular orientation of cylindrical domains upon solvent annealing thin films of polystyrene-b-polylactide

Marylène Vayer, Marc A. Hillmyer, Mohammed Dirany, Guillaume Thevenin, René Erre, Christophe Sinturel

Chemistry (Twin Cities)

Research output: Contribution to journal › Article › peer-review

76 Scopus citations

Abstract

Polystyrene-b-polylactide (PS-PLA) was employed as a precursor to nanoporous thin films containing perpendicular cylindrical channels. Cylinder-forming PS-PLA was spin coated onto Si substrate and solvent annealed using acetone, chlorobenzene and tetrahydrofuran (THF) for different durations. By atomic force microscopy, three types of final morphology were observed at the free surface of the films (PLA surface layer, perpendicular cylinders and parallel cylinders) depending on the type of solvent and annealing time. Well-organized perpendicular domains were obtained by annealing in THF. From this oriented PS-PLA annealed thin films, a mild hydrolysis led to a highly ordered array of perpendicularly-oriented cylindrical nanopores arranged on a hexagonal lattice, rendering the resulting nanoporous mask useful for nanopattern transfer processes. The weak resistance of the film/substrate interface during PLA etching was overcome by UV light exposure prior hydrolysis.

Original language	English (US)
Pages (from-to)	3710-3715
Number of pages	6
Journal	Thin Solid Films
Volume	518
Issue number	14
DOIs	https://doi.org/10.1016/j.tsf.2009.10.015
State	Published - May 3 2010

Bibliographical note

Funding Information:
MAH thanks Université d'Orléans for supporting a visiting professorship and the National Science Foundation ( DMR-0605880 ) for support of this work. We also thank Andrew Zalusky and Marc Rodwogin for preparation and characterization of the PS-PLA used in this work, Majorie Roulet for samples preparation and Annie Richard for SEM imaging.

Keywords

Atomic force microscopy
Nanolithography
Polymer

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title = "Perpendicular orientation of cylindrical domains upon solvent annealing thin films of polystyrene-b-polylactide",

abstract = "Polystyrene-b-polylactide (PS-PLA) was employed as a precursor to nanoporous thin films containing perpendicular cylindrical channels. Cylinder-forming PS-PLA was spin coated onto Si substrate and solvent annealed using acetone, chlorobenzene and tetrahydrofuran (THF) for different durations. By atomic force microscopy, three types of final morphology were observed at the free surface of the films (PLA surface layer, perpendicular cylinders and parallel cylinders) depending on the type of solvent and annealing time. Well-organized perpendicular domains were obtained by annealing in THF. From this oriented PS-PLA annealed thin films, a mild hydrolysis led to a highly ordered array of perpendicularly-oriented cylindrical nanopores arranged on a hexagonal lattice, rendering the resulting nanoporous mask useful for nanopattern transfer processes. The weak resistance of the film/substrate interface during PLA etching was overcome by UV light exposure prior hydrolysis.",

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note = "Funding Information: MAH thanks Universit{\'e} d'Orl{\'e}ans for supporting a visiting professorship and the National Science Foundation ( DMR-0605880 ) for support of this work. We also thank Andrew Zalusky and Marc Rodwogin for preparation and characterization of the PS-PLA used in this work, Majorie Roulet for samples preparation and Annie Richard for SEM imaging.",

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AU - Dirany, Mohammed

AU - Thevenin, Guillaume

AU - Erre, René

AU - Sinturel, Christophe

N1 - Funding Information: MAH thanks Université d'Orléans for supporting a visiting professorship and the National Science Foundation ( DMR-0605880 ) for support of this work. We also thank Andrew Zalusky and Marc Rodwogin for preparation and characterization of the PS-PLA used in this work, Majorie Roulet for samples preparation and Annie Richard for SEM imaging.

PY - 2010/5/3

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N2 - Polystyrene-b-polylactide (PS-PLA) was employed as a precursor to nanoporous thin films containing perpendicular cylindrical channels. Cylinder-forming PS-PLA was spin coated onto Si substrate and solvent annealed using acetone, chlorobenzene and tetrahydrofuran (THF) for different durations. By atomic force microscopy, three types of final morphology were observed at the free surface of the films (PLA surface layer, perpendicular cylinders and parallel cylinders) depending on the type of solvent and annealing time. Well-organized perpendicular domains were obtained by annealing in THF. From this oriented PS-PLA annealed thin films, a mild hydrolysis led to a highly ordered array of perpendicularly-oriented cylindrical nanopores arranged on a hexagonal lattice, rendering the resulting nanoporous mask useful for nanopattern transfer processes. The weak resistance of the film/substrate interface during PLA etching was overcome by UV light exposure prior hydrolysis.

AB - Polystyrene-b-polylactide (PS-PLA) was employed as a precursor to nanoporous thin films containing perpendicular cylindrical channels. Cylinder-forming PS-PLA was spin coated onto Si substrate and solvent annealed using acetone, chlorobenzene and tetrahydrofuran (THF) for different durations. By atomic force microscopy, three types of final morphology were observed at the free surface of the films (PLA surface layer, perpendicular cylinders and parallel cylinders) depending on the type of solvent and annealing time. Well-organized perpendicular domains were obtained by annealing in THF. From this oriented PS-PLA annealed thin films, a mild hydrolysis led to a highly ordered array of perpendicularly-oriented cylindrical nanopores arranged on a hexagonal lattice, rendering the resulting nanoporous mask useful for nanopattern transfer processes. The weak resistance of the film/substrate interface during PLA etching was overcome by UV light exposure prior hydrolysis.

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KW - Nanolithography

KW - Polymer

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Perpendicular orientation of cylindrical domains upon solvent annealing thin films of polystyrene-b-polylactide

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