Photochemical reactions for replicating and aligning block copolymer thin film patterns

Dustin W. Janes; Takejiro Inoue; Bradley D. McCoy; Ishita Madan; Paul F. Nealey; C. Grant Willson; Christopher J. Ellison

doi:10.2494/photopolymer.27.435

Photochemical reactions for replicating and aligning block copolymer thin film patterns

Dustin W. Janes, Takejiro Inoue, Bradley D. McCoy, Ishita Madan, Paul F. Nealey, C. Grant Willson, Christopher J. Ellison

Research output: Contribution to journal › Article › peer-review

5 Scopus citations

Abstract

A photochemical process for transfer printing patterns formed by block copolymer thin films is described here. An unpatterned, transparent substrate coated in liquid conformal layer is pressed to an epitaxially aligned block copolymer thin film. Irradiation through the sample stack by UV light drives a benzophenone-mediated grafting reaction which covalently bonds the top surface of the block copolymer film to the photopolymerized conformal layer. Separation of the sample stack recovers the original guiding pattern as well a new chemically patterned substrate replicated from the original pattern. Using a single lithographically directed chemical pattern, 10 replicas are generated, each possessing 28 nm periodicity, perpendicularly oriented microdomains, and long-range epitaxial alignment.

Original language	English (US)
Pages (from-to)	435-440
Number of pages	6
Journal	Journal of Photopolymer Science and Technology
Volume	27
Issue number	4
DOIs	https://doi.org/10.2494/photopolymer.27.435
State	Published - Sep 13 2014
Externally published	Yes

Bibliographical note

Publisher Copyright:
© 2014SPST.

Keywords

Benzophenone
Block copolymer
Directed self-assembly
Transfer printing

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title = "Photochemical reactions for replicating and aligning block copolymer thin film patterns",

abstract = "A photochemical process for transfer printing patterns formed by block copolymer thin films is described here. An unpatterned, transparent substrate coated in liquid conformal layer is pressed to an epitaxially aligned block copolymer thin film. Irradiation through the sample stack by UV light drives a benzophenone-mediated grafting reaction which covalently bonds the top surface of the block copolymer film to the photopolymerized conformal layer. Separation of the sample stack recovers the original guiding pattern as well a new chemically patterned substrate replicated from the original pattern. Using a single lithographically directed chemical pattern, 10 replicas are generated, each possessing 28 nm periodicity, perpendicularly oriented microdomains, and long-range epitaxial alignment.",

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AU - Janes, Dustin W.

AU - Inoue, Takejiro

AU - McCoy, Bradley D.

AU - Madan, Ishita

AU - Nealey, Paul F.

AU - Grant Willson, C.

AU - Ellison, Christopher J.

PY - 2014/9/13

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AB - A photochemical process for transfer printing patterns formed by block copolymer thin films is described here. An unpatterned, transparent substrate coated in liquid conformal layer is pressed to an epitaxially aligned block copolymer thin film. Irradiation through the sample stack by UV light drives a benzophenone-mediated grafting reaction which covalently bonds the top surface of the block copolymer film to the photopolymerized conformal layer. Separation of the sample stack recovers the original guiding pattern as well a new chemically patterned substrate replicated from the original pattern. Using a single lithographically directed chemical pattern, 10 replicas are generated, each possessing 28 nm periodicity, perpendicularly oriented microdomains, and long-range epitaxial alignment.

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Photochemical reactions for replicating and aligning block copolymer thin film patterns

Abstract

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Keywords

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