Photoinduced disorder in strongly segregated block copolymer composite films for hierarchical pattern formation

Li Yao, James J. Watkins

Research output: Contribution to journalArticlepeer-review

17 Scopus citations

Abstract

Submicrometer patterns of adjacent, well-ordered and disordered domains were obtained using optical lithography by area-selective, photoinduced disordering transitions within block copolymer composite films. Enantiopure tartaric acid was blended with poly(ethylene oxide-block-tert-butyl acrylate), PEO-b-PtBA, copolymers to yield well-ordered films. In the presence of triphenylsulfonium triflate, a photoacid generator, photoinduced disorder was achieved upon UV-exposure by deprotection of the PtBA block to yield poly(acrylic acid). Poly(acrylic acid) is compatible with both PEO and tartaric acid and deprotection yields a phase mixed material and disorder within seconds. Tartaric acid performs two additional functions in this system. First, it increases segregation strength in PEO-b-PtBA, enabling well-ordered systems at low BCP molecular weights, small domain sizes, and rapid disordering kinetics. Second, the presence of tartaric acid suppresses PEO crystallization, resulting in smooth films and eliminating the influence of PEO crystallization on film morphology.

Original languageEnglish (US)
Pages (from-to)1513-1523
Number of pages11
JournalACS Nano
Volume7
Issue number2
DOIs
StatePublished - Feb 26 2013

Keywords

  • block copolymer
  • enantiopure tartaric acid additive
  • hierarchical pattern formation
  • phase separation
  • photoinduced disordering transition

Fingerprint

Dive into the research topics of 'Photoinduced disorder in strongly segregated block copolymer composite films for hierarchical pattern formation'. Together they form a unique fingerprint.

Cite this